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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 18, Iss. 7 — Mar. 29, 2010
  • pp: 6841–6852

Deep and tapered silicon photonic crystals for achieving anti-reflection and enhanced absorption

Yung-Jr Hung, San-Liang Lee, and Larry A. Coldren  »View Author Affiliations


Optics Express, Vol. 18, Issue 7, pp. 6841-6852 (2010)
http://dx.doi.org/10.1364/OE.18.006841


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Abstract

Tapered silicon photonic crystals (PhCs) with smooth sidewalls are realized using a novel single-step deep reactive ion etching. The PhCs can significantly reduce the surface reflection over the wavelength range between the ultra-violet and near-infrared regions. From the measurements using a spectrophotometer and an angle-variable spectroscopic ellipsometer, the sub-wavelength periodic structure can provide a broad and angular-independent antireflective window in the visible region for the TE-polarized light. The PhCs with tapered rods can further reduce the reflection due to a gradually changed effective index. On the other hand, strong optical resonances for TM-mode can be found in this structure, which is mainly due to the existence of full photonic bandgaps inside the material. Such resonance can enhance the optical absorption inside the silicon PhCs due to its increased optical paths. With the help of both antireflective and absorption-enhanced characteristics in this structure, the PhCs can be used for various applications.

© 2010 OSA

OCIS Codes
(160.4760) Materials : Optical properties
(220.4241) Optical design and fabrication : Nanostructure fabrication
(050.5298) Diffraction and gratings : Photonic crystals

ToC Category:
Photonic Crystals

History
Original Manuscript: January 25, 2010
Revised Manuscript: March 12, 2010
Manuscript Accepted: March 12, 2010
Published: March 17, 2010

Citation
Yung-Jr Hung, San-Liang Lee, and Larry A. Coldren, "Deep and tapered silicon photonic crystals for achieving anti-reflection and enhanced absorption," Opt. Express 18, 6841-6852 (2010)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-18-7-6841


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