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Energy Express

  • Editor: Bernard Kippelen
  • Vol. 18, Iss. S3 — Sep. 13, 2010
  • pp: A286–A292

A strong antireflective solar cell prepared by tapering silicon nanowires

Jin-Young Jung, Zhongyi Guo, Sang-Won Jee, Han-Don Um, Kwang-Tae Park, and Jung-Ho Lee  »View Author Affiliations

Optics Express, Vol. 18, Issue S3, pp. A286-A292 (2010)

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Vertically aligned silicon nanowires (SiNWs) were cost-effectively formed on a four-inch silicon wafer using a simple room temperature approach, i.e., metal-assisted electroless etching. Tapering the NWs by post-KOH dipping achieved separation of each NW from the bunched NW, resulting in a strong enhancement of broadband optical absorption. As electroless etching time increases, the optical crossover feature was observed in the tradeoff between enhanced light trapping (by graded-refractive index during initial tapering) and deteriorated reflectance (by decreasing the areal density of NWs during later tapering). Compared to the bunched SiNWs, tapered NW solar cells demonstrated superior photovoltaic characteristics, such as a short circuit current of 17.67 mA/cm2 and a cell conversion efficiency of ~6.56% under 1.5 AM illumination.

© 2010 OSA

OCIS Codes
(310.1210) Thin films : Antireflection coatings
(350.6050) Other areas of optics : Solar energy
(310.6628) Thin films : Subwavelength structures, nanostructures

ToC Category:

Original Manuscript: May 11, 2010
Revised Manuscript: June 23, 2010
Manuscript Accepted: June 23, 2010
Published: June 29, 2010

Jin-Young Jung, Zhongyi Guo, Sang-Won Jee, Han-Don Um, Kwang-Tae Park, and Jung-Ho Lee, "A strong antireflective solar cell prepared by tapering silicon nanowires," Opt. Express 18, A286-A292 (2010)

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