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Energy Express

  • Editor: Bernard Kippelen
  • Vol. 18, Iss. S3 — Sep. 13, 2010
  • pp: A421–A431

Using autocloning effects to develop broad-bandwidth, omnidirectional antireflection structures for silicon solar cells

Y. C. Lee, S. C. Tseng, H. L Chen, C. C. Yu, W. L. Cheng, C. H. Du, and C. H. Lin  »View Author Affiliations


Optics Express, Vol. 18, Issue S3, pp. A421-A431 (2010)
http://dx.doi.org/10.1364/OE.18.00A421


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Abstract

In this study, we used the autocloning effect on pyramid structures to develop broad-bandwidth, omnidirectional antireflection structures for silicon solar cells. The angular dependence of reflectance on several pyramid structures was systematically investigated. The deposition of three-layer autocloned films reduced the refractive index gap between air and silicon, resulting in an increase in the amount of transmitted light and a decrease in the total light escaping. The average reflectance decreased dramatically to ca. 2–3% at incident angles from 0 to 60° for both sub-wavelength– and micrometer–scale pyramid structures. The measured reflectance of the autocloned structure was less than 4% in the wavelength range from 400 to 1000 nm for incident angles from 0 to 60°. Therefore, the autocloning technique, combined with optical thin films and optical gradient structures, is a practical and compatible method for the fabrication of broad-bandwidth, omnidirectional antireflection structures on silicon solar cells.

© 2010 OSA

OCIS Codes
(040.5350) Detectors : Photovoltaic
(310.1210) Thin films : Antireflection coatings
(350.6050) Other areas of optics : Solar energy

ToC Category:
Thin Films

History
Original Manuscript: June 24, 2010
Revised Manuscript: August 12, 2010
Manuscript Accepted: August 13, 2010
Published: August 24, 2010

Citation
Y. C. Lee, S. C. Tseng, H. L Chen, C. C. Yu, W. L. Cheng, C. H. Du, and C. H. Lin, "Using autocloning effects to develop broad-bandwidth, omnidirectional antireflection structures for silicon solar cells," Opt. Express 18, A421-A431 (2010)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-18-S3-A421


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