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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 19, Iss. 1 — Jan. 3, 2011
  • pp: 175–184

Ultra-high resolution zone-doubled diffractive X-ray optics for the multi-keV regime

Joan Vila-Comamala, Sergey Gorelick, Elina Färm, Cameron M. Kewish, Ana Diaz, Ray Barrett, Vitaliy A. Guzenko, Mikko Ritala, and Christian David  »View Author Affiliations


Optics Express, Vol. 19, Issue 1, pp. 175-184 (2011)
http://dx.doi.org/10.1364/OE.19.000175


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Abstract

X-ray microscopy based on Fresnel zone plates is a powerful technique for sub-100 nm resolution imaging of biological and inorganic materials. Here, we report on the modeling, fabrication and characterization of zone-doubled Fresnel zone plates for the multi-keV regime (4―12 keV). We demonstrate unprecedented spatial resolution by resolving 15 nm lines and spaces in scanning transmission X-ray microscopy, and focusing diffraction efficiencies of 7.5% at 6.2 keV photon energy. These developments represent a significant step towards 10 nm spatial resolution for hard X-ray energies of up to 12 keV.

© 2010 OSA

OCIS Codes
(110.7440) Imaging systems : X-ray imaging
(340.6720) X-ray optics : Synchrotron radiation
(340.7440) X-ray optics : X-ray imaging
(340.7460) X-ray optics : X-ray microscopy
(050.1965) Diffraction and gratings : Diffractive lenses

ToC Category:
X-ray Optics

History
Original Manuscript: October 21, 2010
Revised Manuscript: December 10, 2010
Manuscript Accepted: December 17, 2010
Published: December 22, 2010

Citation
Joan Vila-Comamala, Sergey Gorelick, Elina Färm, Cameron M. Kewish, Ana Diaz, Ray Barrett, Vitaliy A. Guzenko, Mikko Ritala, and Christian David, "Ultra-high resolution zone-doubled diffractive X-ray optics for the multi-keV regime," Opt. Express 19, 175-184 (2011)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-19-1-175


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