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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 19, Iss. 1 — Jan. 3, 2011
  • pp: 193–205

Damage mechanisms of MoN/SiN multilayer optics for next-generation pulsed XUV light sources

R. Sobierajski, S. Bruijn, A.R. Khorsand, E. Louis, R.W. E. van de Kruijs, T. Burian, J. Chalupsky, J. Cihelka, A. Gleeson, J. Grzonka, E.M. Gullikson, V. Hajkova, S. Hau-Riege, L. Juha, M. Jurek, D. Klinger, J. Krzywinski, R. London, J. B. Pelka, T. Płociński, M. Rasiński, K. Tiedtke, S. Toleikis, L. Vysin, H. Wabnitz, and F. Bijkerk  »View Author Affiliations


Optics Express, Vol. 19, Issue 1, pp. 193-205 (2011)
http://dx.doi.org/10.1364/OE.19.000193


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Abstract

We investigated the damage mechanism of MoN/SiN multilayer XUV optics under two extreme conditions: thermal annealing and irradiation with single shot intense XUV pulses from the free-electron laser facility in Hamburg - FLASH. The damage was studied “post-mortem” by means of X-ray diffraction, interference-polarizing optical microscopy, atomic force microscopy, and scanning transmission electron microscopy. Although the timescale of the damage processes and the damage threshold temperatures were different (in the case of annealing it was the dissociation temperature of Mo2N and in the case of XUV irradiation it was the melting temperature of MoN) the main damage mechanism is very similar: molecular dissociation and the formation of N2, leading to bubbles inside the multilayer structure.

© 2010 OSA

OCIS Codes
(140.2600) Lasers and laser optics : Free-electron lasers (FELs)
(140.3330) Lasers and laser optics : Laser damage
(140.6810) Lasers and laser optics : Thermal effects
(220.0220) Optical design and fabrication : Optical design and fabrication
(230.4170) Optical devices : Multilayers

ToC Category:
Lasers and Laser Optics

History
Original Manuscript: October 20, 2010
Revised Manuscript: December 9, 2010
Manuscript Accepted: December 9, 2010
Published: December 22, 2010

Citation
R. Sobierajski, S. Bruijn, A.R. Khorsand, E. Louis, R.W. E. van de Kruijs, T. Burian, J. Chalupsky, J. Cihelka, A. Gleeson, J. Grzonka, E.M. Gullikson, V. Hajkova, S. Hau-Riege, L. Juha, M. Jurek, D. Klinger, J. Krzywinski, R. London, J. B. Pelka, T. Płociński, M. Rasiński, K. Tiedtke, S. Toleikis, L. Vysin, H. Wabnitz, and F. Bijkerk, "Damage mechanisms of MoN/SiN multilayer optics for next-generation pulsed XUV light sources," Opt. Express 19, 193-205 (2011)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-19-1-193


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