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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 19, Iss. 10 — May. 9, 2011
  • pp: 8985–8993

Fabrication of optical mosaic gratings: a self-referencing alignment method

Lei Shi and Lijiang Zeng  »View Author Affiliations


Optics Express, Vol. 19, Issue 10, pp. 8985-8993 (2011)
http://dx.doi.org/10.1364/OE.19.008985


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Abstract

We propose and demonstrate a self-referencing alignment technique to conveniently enlarge fabricated grating area. The latent image gratings are used as the reference objects to align (adjust and lock) the attitude and position of the substrate relative to the exposure beams between and during consecutive exposures. The adjustment system and the fringe-locking system are combined into the exposure system, eliminating the drift errors between them and making the whole system low-cost and compact. For the fabricated 1 × 4 mosaics of 50 × (30 + 30 + 30 + 30) mm2 area and 1 × 2 mosaics of 90 × (80 + 80) mm2 area, the typical peak-valley −1st-order wavefront errors measured by a 100-mm-diameter interferometer are not more than 0.06 λ and 0.09 λ, respectively.

© 2011 OSA

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(050.7330) Diffraction and gratings : Volume gratings
(090.2880) Holography : Holographic interferometry
(120.3180) Instrumentation, measurement, and metrology : Interferometry
(220.3740) Optical design and fabrication : Lithography
(320.5520) Ultrafast optics : Pulse compression

ToC Category:
Diffraction and Gratings

History
Original Manuscript: February 8, 2011
Revised Manuscript: April 18, 2011
Manuscript Accepted: April 19, 2011
Published: April 25, 2011

Citation
Lei Shi and Lijiang Zeng, "Fabrication of optical mosaic gratings: a self-referencing alignment method," Opt. Express 19, 8985-8993 (2011)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-19-10-8985


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