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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 19, Iss. 10 — May. 9, 2011
  • pp: 9541–9550

A 50nm spatial resolution EUV imaging–resolution dependence on object thickness and illumination bandwidth

Przemyslaw W. Wachulak, Andrzej Bartnik, Henryk Fiedorowicz, and Jerzy Kostecki  »View Author Affiliations

Optics Express, Vol. 19, Issue 10, pp. 9541-9550 (2011)

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In this paper we report a desk-top microscopy reaching 50nm spatial resolution in very compact setup using a gas-puff laser plasma EUV source. The thickness of an object and the bandwidth of illuminating radiation were studied in order to estimate their quantitative influence on the EUV microscope spatial resolution. EUV images of various thickness objects obtained by illumination with variable bandwidth EUV radiation were compared in terms of knife-edge spatial resolution to study the bandwidth/object thickness parasitic influence on spatial resolution of the EUV microscope.

© 2011 OSA

OCIS Codes
(110.7440) Imaging systems : X-ray imaging
(180.7460) Microscopy : X-ray microscopy
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)
(050.1965) Diffraction and gratings : Diffractive lenses

ToC Category:
X-ray Optics

Original Manuscript: March 4, 2011
Revised Manuscript: April 8, 2011
Manuscript Accepted: April 11, 2011
Published: May 2, 2011

Virtual Issues
Vol. 6, Iss. 6 Virtual Journal for Biomedical Optics

Przemyslaw W. Wachulak, Andrzej Bartnik, Henryk Fiedorowicz, and Jerzy Kostecki, "A 50nm spatial resolution EUV imaging–resolution dependence on object thickness and illumination bandwidth," Opt. Express 19, 9541-9550 (2011)

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