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Antireflective property of thin film a-Si solar cell structures with graded refractive index structure

Sung Jun Jang, Young Min Song, Chan Il Yeo, Chang Young Park, Jae Su Yu, and Yong Tak Lee

Open Access Open Access

Abstract

We report the antireflective property of thin film amorphous silicon (a-Si) solar cell structures based on graded refractive index structure together with theoretical analysis. Optimizations of the index profile are performed using the rigorous coupled-wave analysis method. The graded refractive index structure fabricated by oblique angle deposition suppresses optical reflection over a wide range of wavelength and incident angle, compared to the conventional structure. The average reflectance of thin film a-Si solar cell structure with the graded refractive index structure is suppressed by 54% at normal incidence due to the effective refractive index matching between ITO and a-Si, indicating a reasonable agreement with calculated results.

©2011 Optical Society of America

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Figures (8)
Fig. 1
Fig. 1 (a) Schematic diagrams of typical superstrate type thin film solar cell structure (Sample A) and proposed structure with GRIS (Sample B). The magnified images in red squares express the light propagation through the interface between ITO and a-Si layer with and without the GRIS. (b) Electric field distribution in the structures with and without the GRIS.

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Fig. 2
Fig. 2 Calculated reflectance of (a) Linear, (b) Quintic, (c) Gaussian, and (d) Cubic index profiles as function of wavelength in the range of 400-800 nm for incident angles of 20-70°. (e) Calculated average reflectance of various index profiles of the GRIS and of the structure without the GRIS as a function of incident angle of light.

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Fig. 3
Fig. 3 (a) Calculated reflectance of sample A (without the GRIS) and B (with the GRIS) at normal incidence as a function of wavelength. (b) Effective refractive index profile of the Cubic index profile as a function of thickness. The effective refractive index is chosen at the wavelength of 600 nm.

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Fig. 4
Fig. 4 SEM image of the structure (a) with and (b) without the GRIS. The inset of (a) is a TEM image of the GRIS. The magnified TEM image shows the distinct nanocolumnar structure of GRIS.

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Fig. 5
Fig. 5 Tangent rule and Cosine rule between the incident angle of e-beam flux and the inclined angle of nanocolumnar structure. The star marks indicate the experimental points of each layer of the GRIS.

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Fig. 6
Fig. 6 Measured reflectance of sample A (without the GRIS) and B (with the GRIS) at normal incidence as a function of wavelength.

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Fig. 7
Fig. 7 Calculated reflectance of the structures (a) without and (b) with the GRIS as function of wavelength and incident angle. Measured reflectance of the structures (c) without and (d) with the GRIS as function of wavelength and incident angle.

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Fig. 8
Fig. 8 Measured average reflectance of sample A and B as a function of incident angle for unpolarized light.

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Tables (1)

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Table 1 Thickness of 5 layers and their measured refractive indices for different graded index profiles

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Equations (4)

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n ( x ) = n I T O + ( n a - S i − n I T O ) x ,
n ( x ) = n I T O + ( n a - S i − n I T O ) ( 10 x 3 − 15 x 4 + 6 x 5 ) ,
n ( x ) = n I T O + ( n a - S i − n I T O ) e x p [ - ( x − 1 0.4 ) 2 ] ,
n ( x ) = n I T O + ( n a - S i − n I T O ) ( − 0.3 x 3 + 2.4 x 2 − 6.4 x + 6.2 ) ,
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