Periodic micro and nano-structures can be lithographically produced using the Talbot effect. However, the limited depth-of-field of the self-images has effectively prevented its practical use, especially for high-resolution structures with periods less than 1 micrometer. In this article we show that by integrating the diffraction field transmitted by a grating mask over a distance of one Talbot period, one can obtain an effective image that is independent of the absolute distance from the mask. In this way high resolution periodic patterns can be printed without the depth-of-field limitation of Talbot self-images. For one-dimensional patterns the image obtained is shown to be related to the convolution of the mask transmission function with itself. This technique, which we call Displacement Talbot Lithography (DTL), enables high-resolution photolithography without the need for complex and expensive projection optics for the production of periodic structures like diffraction gratings or photonic crystals. Experimental results showing the printing of linear gratings and an array of holes on a hexagonal lattice are presented.

© 2011 OSA

1. R. D. Piner, J. Zhu, F. Xu, S. H. Hong, and C. A. Mirkin, ““Dip-Pen” nanolithography, ” Science 283(5402), 661–663 (1999). [CrossRef] [PubMed]
2. S. R. J. Brueck, “Optical and interferometric lithography––nanotechnology enablers,” Proc. IEEE 93(10), 1704–1721 (2005). [CrossRef]
3. T. A. Savas, M. L. Schattenburg, J. M. Carter, and H. I. Smith, “Large‐area achromatic interferometric lithography for 100 nm period gratings and grids,” J. Vac. Sci. Technol. B 14(6), 4167–4170 (1996). [CrossRef]
4. S. Y. Chou, P. R. Krauss, and P. J. Renstrom, “Imprint of sub-25nm vias and trenches in polymers,” Appl. Phys. Lett. 67(21), 3114–3116 (1995). [CrossRef]
5. W. H. F. Talbot, “Facts relating to optical science,” Philos. Mag. 9, 403–405 (1836).
6. D. J. Shir, S. Jeon, H. Liao, M. Highland, D. G. Cahill, M. F. Su, I. F. El-Kady, C. G. Christodoulou, G. R. Bogart, A. V. Hamza, and J. A. Rogers, “Three-dimensional nanofabrication with elastomeric phase masks,” J. Phys. Chem. B 111(45), 12945–12958 (2007). [CrossRef] [PubMed]
7. D. C. Flanders, A. M. Hawryluk, and H. I. Smith, “Spatial period division – a new technique for exposing sub-micrometer linewidth periodic and quasi periodic patterns,” J. Vac. Sci. Technol. 16(6), 1949–1952 (1979). [CrossRef]
8. C. Zanke, M. H. Qi, and H. I. Smith, “Large-area patterning for photonic crystals via coherent diffraction lithography,” J. Vac. Sci. Technol. B 22(6), 3352–3355 (2004). [CrossRef]
9. H. H. Solak and Y. Ekinci, “Achromatic spatial frequency multiplication: a method for production of nanometer-scale periodic structures,” J. Vac. Sci. Technol. B 23(6), 2705–2710 (2005). [CrossRef]
10. H. H. Solak, “A system and a method for generating periodic and/or quasi-periodic pattern on a sample.” Int’l. patent 1810085 (16 March 2011).
11. J. W. Goodman, Introduction to Fourier Optics (McGraw-Hill Book Co., 1968), p. 48.
12. Y. Bourgin, Y. Jourlin, O. Parriaux, A. Talneau, S. Tonchev, C. Veillas, P. Karvinen, N. Passilly, A. R. Md Zain, R. M. De La Rue, J. Van Erps, and D. Troadec, “100 nm period grating by high-index phase-mask immersion lithography,” Opt. Express 18(10), 10557–10566 (2010). [CrossRef] [PubMed]
13. K. Knop, “Rigorous diffraction theory for transmission phase gratings with deep rectangular grooves,” J. Opt. Soc. Am. 68(9), 1206–1210 (1978). [CrossRef]
14. D. M. Tennant, T. L. Koch, P. P. Mulgrew, R. P. Gnall, F. Ostermeyer, and J.-M. Verdiell, “Characterization of near field holography grating masks for optoelectronics fabricated by electron beam lithography,” J. Vac. Sci. Technol. B 10(6), 2530–2535 (1992). [CrossRef]

Bogart, G. R.
Bourgin, Y.
Brueck, S. R. J.
Cahill, D. G.
Carter, J. M.
Chou, S. Y.
Christodoulou, C. G.
De La Rue, R. M.
Ekinci, Y.
El-Kady, I. F.
Flanders, D. C.
Gnall, R. P.
Hamza, A. V.
Hawryluk, A. M.
Highland, M.
Hong, S. H.
Jeon, S.
Jourlin, Y.
Karvinen, P.
Knop, K.
Koch, T. L.
Krauss, P. R.
Liao, H.
Md Zain, A. R.
Mirkin, C. A.
Mulgrew, P. P.
Ostermeyer, F.
Parriaux, O.
Passilly, N.
Piner, R. D.
Qi, M. H.
Renstrom, P. J.
Rogers, J. A.
Savas, T. A.
Schattenburg, M. L.
Shir, D. J.
Smith, H. I.
Solak, H. H.
Su, M. F.
Talbot, W. H. F.
Talneau, A.
Tennant, D. M.
Tonchev, S.
Troadec, D.
Van Erps, J.
Veillas, C.
Verdiell, J.-M.
Xu, F.
Zanke, C.
Zhu, J.

Appl. Phys. Lett.

• S. Y. Chou, P. R. Krauss, and P. J. Renstrom, “Imprint of sub-25nm vias and trenches in polymers,” Appl. Phys. Lett. 67(21), 3114–3116 (1995). [CrossRef]

J. Opt. Soc. Am.

• K. Knop, “Rigorous diffraction theory for transmission phase gratings with deep rectangular grooves,” J. Opt. Soc. Am. 68(9), 1206–1210 (1978). [CrossRef]

J. Phys. Chem. B

• D. J. Shir, S. Jeon, H. Liao, M. Highland, D. G. Cahill, M. F. Su, I. F. El-Kady, C. G. Christodoulou, G. R. Bogart, A. V. Hamza, and J. A. Rogers, “Three-dimensional nanofabrication with elastomeric phase masks,” J. Phys. Chem. B 111(45), 12945–12958 (2007). [CrossRef] [PubMed]

J. Vac. Sci. Technol.

• D. C. Flanders, A. M. Hawryluk, and H. I. Smith, “Spatial period division – a new technique for exposing sub-micrometer linewidth periodic and quasi periodic patterns,” J. Vac. Sci. Technol. 16(6), 1949–1952 (1979). [CrossRef]

J. Vac. Sci. Technol. B

• C. Zanke, M. H. Qi, and H. I. Smith, “Large-area patterning for photonic crystals via coherent diffraction lithography,” J. Vac. Sci. Technol. B 22(6), 3352–3355 (2004). [CrossRef]
• H. H. Solak and Y. Ekinci, “Achromatic spatial frequency multiplication: a method for production of nanometer-scale periodic structures,” J. Vac. Sci. Technol. B 23(6), 2705–2710 (2005). [CrossRef]
• D. M. Tennant, T. L. Koch, P. P. Mulgrew, R. P. Gnall, F. Ostermeyer, and J.-M. Verdiell, “Characterization of near field holography grating masks for optoelectronics fabricated by electron beam lithography,” J. Vac. Sci. Technol. B 10(6), 2530–2535 (1992). [CrossRef]
• T. A. Savas, M. L. Schattenburg, J. M. Carter, and H. I. Smith, “Large‐area achromatic interferometric lithography for 100 nm period gratings and grids,” J. Vac. Sci. Technol. B 14(6), 4167–4170 (1996). [CrossRef]

Opt. Express

• Y. Bourgin, Y. Jourlin, O. Parriaux, A. Talneau, S. Tonchev, C. Veillas, P. Karvinen, N. Passilly, A. R. Md Zain, R. M. De La Rue, J. Van Erps, and D. Troadec, “100 nm period grating by high-index phase-mask immersion lithography,” Opt. Express 18(10), 10557–10566 (2010). [CrossRef] [PubMed]

Philos. Mag.

• W. H. F. Talbot, “Facts relating to optical science,” Philos. Mag. 9, 403–405 (1836).

Proc. IEEE

• S. R. J. Brueck, “Optical and interferometric lithography––nanotechnology enablers,” Proc. IEEE 93(10), 1704–1721 (2005). [CrossRef]

Science

• R. D. Piner, J. Zhu, F. Xu, S. H. Hong, and C. A. Mirkin, ““Dip-Pen” nanolithography, ” Science 283(5402), 661–663 (1999). [CrossRef] [PubMed]

Other

• H. H. Solak, “A system and a method for generating periodic and/or quasi-periodic pattern on a sample.” Int’l. patent 1810085 (16 March 2011).
• J. W. Goodman, Introduction to Fourier Optics (McGraw-Hill Book Co., 1968), p. 48.

2010, Bourgin, Opt. Express
2007, Shir, J. Phys. Chem. B
2005, Brueck, Proc. IEEE
2005, Solak, J. Vac. Sci. Technol. B
2004, Zanke, J. Vac. Sci. Technol. B
1999, Piner, Science
1996, Savas, J. Vac. Sci. Technol. B
1995, Chou, Appl. Phys. Lett.
1992, Tennant, J. Vac. Sci. Technol. B
1979, Flanders, J. Vac. Sci. Technol.
1978, Knop, J. Opt. Soc. Am.
1836, Talbot, Philos. Mag.

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