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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 19, Iss. 11 — May. 23, 2011
  • pp: 10950–10958

Optics InfoBase > Optics Express > Volume 19 > Issue 11 > Page 10950

Photolithographically fabricated low-loss asymmetric silicon slot waveguides

Alexander Spott, Tom Baehr-Jones, Ran Ding, Yang Liu, Richard Bojko, Trevor O’Malley, Andrew Pomerene, Craig Hill, Wesley Reinhardt, and Michael Hochberg  »View Author Affiliations


Optics Express, Vol. 19, Issue 11, pp. 10950-10958 (2011)
http://dx.doi.org/10.1364/OE.19.010950


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Abstract

We demonstrate low-loss asymmetric slot waveguides in silicon-on-insulator (SOI). 130 and 180 nm wide slots were fabricated with a 248 nm stepper, in 200 nm thick silicon. An asymmetric waveguide design is shown to expand the range in which the TE0 mode is guided and suppress the TE1 mode, while still maintaining a sharp concentration of electric field in the center of the slot. Optical propagation losses of 2 dB/cm or less are shown for asymmetric slot waveguides with 130 nm wide slots and 320 and 100 nm wide arms.

© 2011 OSA

OCIS Codes
(130.2790) Integrated optics : Guided waves
(130.3060) Integrated optics : Infrared
(130.3120) Integrated optics : Integrated optics devices

ToC Category:
Integrated Optics

History
Original Manuscript: April 13, 2011
Revised Manuscript: May 12, 2011
Manuscript Accepted: May 17, 2011
Published: May 20, 2011

Citation
Alexander Spott, Tom Baehr-Jones, Ran Ding, Yang Liu, Richard Bojko, Trevor O’Malley, Andrew Pomerene, Craig Hill, Wesley Reinhardt, and Michael Hochberg, "Photolithographically fabricated low-loss asymmetric silicon slot waveguides," Opt. Express 19, 10950-10958 (2011)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-19-11-10950


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