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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 19, Iss. 12 — Jun. 6, 2011
  • pp: 11451–11456

Direct laser writing for active and passive high-Q polymer microdisks on silicon

Tobias Grossmann, Simone Schleede, Mario Hauser, Torsten Beck, Michael Thiel, Georg von Freymann, Timo Mappes, and Heinz Kalt  »View Author Affiliations

Optics Express, Vol. 19, Issue 12, pp. 11451-11456 (2011)

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We report the fabrication of high-Q polymeric microdisks on silicon via direct laser writing utilizing two-photon absorption induced polymerization. The quality factors of the passive cavities are above 106 in the 1300 nm wavelength region. The flexible three-dimensional (3D) lithography method allows for the fabrication of different cavity thicknesses on the same substrate, useful for rapid prototyping of active and passive optical microcavities. Microdisk lasers are realized by doping the resist with dye, resulting in laser emission at visible wavelengths.

© 2011 OSA

OCIS Codes
(140.2050) Lasers and laser optics : Dye lasers
(140.7300) Lasers and laser optics : Visible lasers
(160.5470) Materials : Polymers
(220.4000) Optical design and fabrication : Microstructure fabrication
(140.3948) Lasers and laser optics : Microcavity devices

ToC Category:
Lasers and Laser Optics

Original Manuscript: April 11, 2011
Revised Manuscript: May 17, 2011
Manuscript Accepted: May 19, 2011
Published: May 27, 2011

Tobias Grossmann, Simone Schleede, Mario Hauser, Torsten Beck, Michael Thiel, Georg von Freymann, Timo Mappes, and Heinz Kalt, "Direct laser writing for active and passive high-Q polymer microdisks on silicon," Opt. Express 19, 11451-11456 (2011)

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