Determination of the evolution of layer thickness errors and interfacial imperfections in ultrathin sputtered Cr/C multilayers using high-resolution transmission electron microscopy

doi:10.1364/OE.19.011815

Determination of the evolution of layer thickness errors and interfacial imperfections in ultrathin sputtered Cr/C multilayers using high-resolution transmission electron microscopy

Hui Jiang, Alan Michette, Slawka Pfauntsch, Zhanshan Wang, Jingtao Zhu, and Dehui Li »View Author Affiliations

Optics Express, Vol. 19, Issue 12, pp. 11815-11824 (2011)
http://dx.doi.org/10.1364/OE.19.011815

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Abstract
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Abstract

The structures of ultrathin sputtered Cr/C multilayers were determined by high-resolution transmission electron microscopy. The evolution of layer thickness errors, interdiffusion and interfacial roughness were simulated using time series models. The results show that with increasing of interdiffusion and roughness the multilayer thickness ratio changes, thereby influencing the optical performance. All structural parameters show good correlation with and influence adjacent layers. The system errors of the deposition equipment can also be evaluated by the models.

OCIS Codes
(310.0310) Thin films : Thin films
(340.0340) X-ray optics : X-ray optics

ToC Category:
Thin Films

History
Original Manuscript: March 18, 2011
Manuscript Accepted: May 23, 2011
Published: June 2, 2011

Citation
Hui Jiang, Alan Michette, Slawka Pfauntsch, Zhanshan Wang, Jingtao Zhu, and Dehui Li, "Determination of the evolution of layer thickness errors and interfacial imperfections in ultrathin sputtered Cr/C multilayers using high-resolution transmission electron microscopy," Opt. Express 19, 11815-11824 (2011)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-19-12-11815

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References

H. Jiang, A. Michette, S. Pfauntsch, D. Hart and M. Shand, “Design of narrowband multilayer for Cr Kα X-rays,” in Proceedings of PIER (Xi’an, China, 2010), pp. 61–65.
W. Sevenhans, M. Gijs, Y. Bruynseraede, H. Homma, and I. K. Schuller, “Cumulative disorder and x-ray line broadening in multilayers,” Phys. Rev. B Condens. Matter 34(8), 5955–5958 (1986). [CrossRef] [PubMed]
H. Jiang, J. Zhu, J. Xu, X. Wang, Z. Wang, and M. Watanabe, “Determination of layer-thickness variation in periodic multilayer by X-ray reflectivity,” J. Appl. Phys. 107(10), 103523 (2010). [CrossRef]
A. Aschentrup, W. Hachmann, T. Westerwalbesloh, Y. Lim, U. Kleineberg, and U. Heinzmann, “Determination of layer-thickness fluctuations in Mo/Si multilayers by cross-sectional HR-TEM and X-ray diffraction,” Appl. Phys., A Mater. Sci. Process. 77(5), 607–611 (2003). [CrossRef]
I. Nedelcu, R. W. E. van de Kruijs, A. E. Yakshin, F. Tichelaar, E. Zoethout, E. Louis, H. Enkisch, S. Muellender, and F. Bijkerk, “Interface roughness in Mo/Si multilayers,” Thin Solid Films 515(2), 434–438 (2006). [CrossRef]
E. E. Fullerton, J. Pearson, C. H. Sowers, S. D. Bader, X. Z. Wu, and S. K. Sinha, “Interfacial roughness of sputtered multilayers: Nb/Si,” Phys. Rev. B Condens. Matter 48(23), 17432–17444 (1993). [CrossRef] [PubMed]
S. Deng, H. Qi, K. Yi, Z. Fan, and J. Shao, “Effect of defects on the reflectivity of Cr/C multilayer soft X-ray mirror at 4.48nm,” Appl. Surf. Sci. 255(16), 7434–7438 (2009). [CrossRef]

Aschentrup, A.
Bader, S. D.
Bijkerk, F.
Bruynseraede, Y.
Deng, S.
Enkisch, H.
Fan, Z.
Fullerton, E. E.
Gijs, M.
Hachmann, W.
Heinzmann, U.
Homma, H.
Jiang, H.
Kleineberg, U.
Lim, Y.
Louis, E.
Muellender, S.
Nedelcu, I.
Pearson, J.
Qi, H.
Schuller, I. K.
Sevenhans, W.
Shao, J.
Sinha, S. K.
Sowers, C. H.
Tichelaar, F.
van de Kruijs, R. W. E.
Wang, X.
Wang, Z.
Watanabe, M.
Westerwalbesloh, T.
Wu, X. Z.
Xu, J.
Yakshin, A. E.
Yi, K.
Zhu, J.
Zoethout, E.

Appl. Phys., A Mater. Sci. Process.

A. Aschentrup, W. Hachmann, T. Westerwalbesloh, Y. Lim, U. Kleineberg, and U. Heinzmann, “Determination of layer-thickness fluctuations in Mo/Si multilayers by cross-sectional HR-TEM and X-ray diffraction,” Appl. Phys., A Mater. Sci. Process. 77(5), 607–611 (2003). [CrossRef]

Appl. Surf. Sci.

S. Deng, H. Qi, K. Yi, Z. Fan, and J. Shao, “Effect of defects on the reflectivity of Cr/C multilayer soft X-ray mirror at 4.48nm,” Appl. Surf. Sci. 255(16), 7434–7438 (2009). [CrossRef]

J. Appl. Phys.

H. Jiang, J. Zhu, J. Xu, X. Wang, Z. Wang, and M. Watanabe, “Determination of layer-thickness variation in periodic multilayer by X-ray reflectivity,” J. Appl. Phys. 107(10), 103523 (2010). [CrossRef]

Phys. Rev. B Condens. Matter

E. E. Fullerton, J. Pearson, C. H. Sowers, S. D. Bader, X. Z. Wu, and S. K. Sinha, “Interfacial roughness of sputtered multilayers: Nb/Si,” Phys. Rev. B Condens. Matter 48(23), 17432–17444 (1993). [CrossRef] [PubMed]
W. Sevenhans, M. Gijs, Y. Bruynseraede, H. Homma, and I. K. Schuller, “Cumulative disorder and x-ray line broadening in multilayers,” Phys. Rev. B Condens. Matter 34(8), 5955–5958 (1986). [CrossRef] [PubMed]

Thin Solid Films

I. Nedelcu, R. W. E. van de Kruijs, A. E. Yakshin, F. Tichelaar, E. Zoethout, E. Louis, H. Enkisch, S. Muellender, and F. Bijkerk, “Interface roughness in Mo/Si multilayers,” Thin Solid Films 515(2), 434–438 (2006). [CrossRef]

Other

H. Jiang, A. Michette, S. Pfauntsch, D. Hart and M. Shand, “Design of narrowband multilayer for Cr Kα X-rays,” in Proceedings of PIER (Xi’an, China, 2010), pp. 61–65.

2010, Jiang, J. Appl. Phys.
2009, Deng, Appl. Surf. Sci.
2006, Nedelcu, Thin Solid Films
2003, Aschentrup, Appl. Phys., A Mater. Sci. Process.
1993, Fullerton, Phys. Rev. B Condens. Matter
1986, Sevenhans, Phys. Rev. B Condens. Matter

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