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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 19, Iss. 12 — Jun. 6, 2011
  • pp: 11815–11824

Determination of the evolution of layer thickness errors and interfacial imperfections in ultrathin sputtered Cr/C multilayers using high-resolution transmission electron microscopy

Hui Jiang, Alan Michette, Slawka Pfauntsch, Zhanshan Wang, Jingtao Zhu, and Dehui Li  »View Author Affiliations


Optics Express, Vol. 19, Issue 12, pp. 11815-11824 (2011)
http://dx.doi.org/10.1364/OE.19.011815


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Abstract

The structures of ultrathin sputtered Cr/C multilayers were determined by high-resolution transmission electron microscopy. The evolution of layer thickness errors, interdiffusion and interfacial roughness were simulated using time series models. The results show that with increasing of interdiffusion and roughness the multilayer thickness ratio changes, thereby influencing the optical performance. All structural parameters show good correlation with and influence adjacent layers. The system errors of the deposition equipment can also be evaluated by the models.

© 2011 OSA

OCIS Codes
(310.0310) Thin films : Thin films
(340.0340) X-ray optics : X-ray optics

ToC Category:
Thin Films

History
Original Manuscript: March 18, 2011
Manuscript Accepted: May 23, 2011
Published: June 2, 2011

Citation
Hui Jiang, Alan Michette, Slawka Pfauntsch, Zhanshan Wang, Jingtao Zhu, and Dehui Li, "Determination of the evolution of layer thickness errors and interfacial imperfections in ultrathin sputtered Cr/C multilayers using high-resolution transmission electron microscopy," Opt. Express 19, 11815-11824 (2011)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-19-12-11815


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References

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