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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 19, Iss. 13 — Jun. 20, 2011
  • pp: 12551–12561

Real-time in situ Mueller matrix ellipsometry of GaSb nanopillars: observation of anisotropic local alignment

Ingar Stian Nerbø, Sebastien Le Roy, Martin Foldyna, Elin Søndergård, and Morten Kildemo  »View Author Affiliations


Optics Express, Vol. 19, Issue 13, pp. 12551-12561 (2011)
http://dx.doi.org/10.1364/OE.19.012551


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Abstract

The formation of GaSb nanopillars by low energy ion sputtering is studied in real-time by spectroscopic Mueller matrix ellipsometry, from the initial formation in the smooth substrate until nanopillars with a height of 200 – 300 nm are formed. As the nanopillar height increased above 100 nm, coupling between orthogonal polarization modes was observed. Ex situ angle resolved Mueller polarimetry measurements revealed a 180° azimuth rotation symmetry in the off-diagonal Mueller elements, which can be explained by a biaxial material with different dielectric functions εx and εy in a plane parallel to the substrate. This polarization coupling can be caused by a tendency for local direction dependent alignment of the pillars, and such a tendency is confirmed by scanning electron microscopy. Such observations have not been made for GaSb nanopillars shorter than 100 nm, which have optical properties that can be modeled as a uniaxial effective medium.

© 2011 OSA

OCIS Codes
(160.4236) Materials : Nanomaterials
(310.6628) Thin films : Subwavelength structures, nanostructures
(240.2130) Optics at surfaces : Ellipsometry and polarimetry

ToC Category:
Instrumentation, Measurement, and Metrology

History
Original Manuscript: April 6, 2011
Revised Manuscript: June 1, 2011
Manuscript Accepted: June 3, 2011
Published: June 14, 2011

Citation
Ingar Stian Nerbø, Sebastien Le Roy, Martin Foldyna, Elin Søndergård, and Morten Kildemo, "Real-time in situ Mueller matrix ellipsometry of GaSb nanopillars: observation of anisotropic local alignment," Opt. Express 19, 12551-12561 (2011)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-19-13-12551


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