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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 19, Iss. 14 — Jul. 4, 2011
  • pp: 13158–13163

Role of rigidity and temperature in the kinetics of photodarkening in GexAs(45-x)Se55 thin films

A. R. Barik, K. V. Adarsh, Ramakanta Naik, R. Ganesan, Guang Yang, Donghui Zhao, Himanshu Jain, and K. Shimakawa  »View Author Affiliations

Optics Express, Vol. 19, Issue 14, pp. 13158-13163 (2011)

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We present insightful results on the kinetics of photodarkening (PD) in GexAs45-xSe55 glasses at the ambient and liquid helium temperatures when the network rigidity is increased by varying x from 0 to 16. We observe a many fold change in PD and its kinetics with decreasing network flexibility and temperature. Moreover, temporal evolution of PD shows a dramatic change with increasing x.

© 2011 OSA

OCIS Codes
(160.2750) Materials : Glass and other amorphous materials
(310.6860) Thin films : Thin films, optical properties
(160.5335) Materials : Photosensitive materials

ToC Category:

Original Manuscript: April 6, 2011
Revised Manuscript: May 19, 2011
Manuscript Accepted: June 8, 2011
Published: June 22, 2011

A. R. Barik, K. V. Adarsh, Ramakanta Naik, R. Ganesan, Guang Yang, Donghui Zhao, Himanshu Jain, and K. Shimakawa, "Role of rigidity and temperature in the kinetics of photodarkening in GexAs(45-x)Se55 thin films," Opt. Express 19, 13158-13163 (2011)

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