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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 19, Iss. 15 — Jul. 18, 2011
  • pp: 13963–13973

Capped Mo/Si multilayers with improved performance at 30.4 nm for future solar missions

Alain Jody Corso, Paola Zuppella, Piergiorgio Nicolosi, David L. Windt, E. Gullikson, and Maria Guglielmina Pelizzo  »View Author Affiliations

Optics Express, Vol. 19, Issue 15, pp. 13963-13973 (2011)

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Novel capping layer structures have been deposited on periodic Mo/Si multilayers to optimize reflectance at 30.4 nm. Design, deposition and characterization of such coatings are presented. Most of the structures proposed show improved performance with respect to standard Mo/Si multilayers and are stable over time. Reflectance at 121.6 nm and in the visible spectral range have been also tested to explore the applicability of such coatings to the Multi Element Telescope for Imaging and Spectroscopy (METIS) instrument, a coronagraph being developed for the ESA Solar Orbiter platform.

© 2011 OSA

OCIS Codes
(230.4170) Optical devices : Multilayers
(260.7200) Physical optics : Ultraviolet, extreme
(310.1860) Thin films : Deposition and fabrication
(350.1260) Other areas of optics : Astronomical optics
(350.6090) Other areas of optics : Space optics
(310.4165) Thin films : Multilayer design

ToC Category:
Thin Films

Original Manuscript: April 6, 2011
Revised Manuscript: June 3, 2011
Manuscript Accepted: June 20, 2011
Published: July 7, 2011

Alain Jody Corso, Paola Zuppella, Piergiorgio Nicolosi, David L. Windt, E. Gullikson, and Maria Guglielmina Pelizzo, "Capped Mo/Si multilayers with improved performance at 30.4 nm for future solar missions," Opt. Express 19, 13963-13973 (2011)

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