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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 19, Iss. 16 — Aug. 1, 2011
  • pp: 15452–15458

Precipitation of silicon nanoclusters by laser direct-write

Waqas Mustafeez, Daeho Lee, Costas Grigoropoulos, and Alberto Salleo  »View Author Affiliations


Optics Express, Vol. 19, Issue 16, pp. 15452-15458 (2011)
http://dx.doi.org/10.1364/OE.19.015452


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Abstract

The ability to use a laser to direct-write tracks of localized emission enhancement in PECVD-deposited Silicon rich oxide (SRO) films is demonstrated. For this purpose, 400nm thick SRO films with varying excess Si content were irradiated with loosely focused 355nm, 12ps pulses at 80MHz while being translated at 2mm/s. Mapping of areas irradiated with energies between 4.7nJ and 5.5nJ/pulse exhibits regions with the largest emission enhancement. Raman and photoluminescence (PL) measurements suggest precipitation of amorphous and crystalline Si nanoclusters. In the most emissive regions, the PL efficiency of the laser-annealed films was ~70% of that obtained by standard oven-annealing processes. Stress in Si crystals in some areas is identified as leading to quenching of the PL and is hypothesized to be caused by the densification of SRO matrix.

© 2011 OSA

OCIS Codes
(140.3390) Lasers and laser optics : Laser materials processing

ToC Category:
Lasers and Laser Optics

History
Original Manuscript: March 24, 2011
Revised Manuscript: June 3, 2011
Manuscript Accepted: June 6, 2011
Published: July 28, 2011

Citation
Waqas Mustafeez, Daeho Lee, Costas Grigoropoulos, and Alberto Salleo, "Precipitation of silicon nanoclusters by laser direct-write," Opt. Express 19, 15452-15458 (2011)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-19-16-15452


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