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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 19, Iss. 21 — Oct. 10, 2011
  • pp: 19919–19924

Full-field microimaging with 8 keV X-rays achieves a spatial resolutions better than 20 nm

Tsung-Yu Chen, Yu-Tung Chen, Cheng-Liang Wang, Ivan M. Kempson, Wah-Keat Lee, Yong S. Chu, Y. Hwu, and G. Margaritondo  »View Author Affiliations


Optics Express, Vol. 19, Issue 21, pp. 19919-19924 (2011)
http://dx.doi.org/10.1364/OE.19.019919


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Abstract

Fresnel zone plates (450 nm thick Au, 25 nm outermost zone width) used as objective lenses in a full field transmission reached a spatial resolution better than 20 nm and 1.5% efficiency with 8 keV photons. Zernike phase contrast was also realized without compromising the resolution. These are very significant achievements in the rapid progress of high-aspect-ratio zone plate fabrication by combined electron beam lithography and electrodeposition.

© 2011 OSA

OCIS Codes
(110.7440) Imaging systems : X-ray imaging
(180.7460) Microscopy : X-ray microscopy

ToC Category:
X-ray Optics

History
Original Manuscript: June 13, 2011
Revised Manuscript: August 19, 2011
Manuscript Accepted: August 24, 2011
Published: September 27, 2011

Virtual Issues
Vol. 6, Iss. 11 Virtual Journal for Biomedical Optics

Citation
Tsung-Yu Chen, Yu-Tung Chen, Cheng-Liang Wang, Ivan M. Kempson, Wah-Keat Lee, Yong S. Chu, Y. Hwu, and G. Margaritondo, "Full-field microimaging with 8 keV X-rays achieves a spatial resolutions better than 20 nm," Opt. Express 19, 19919-19924 (2011)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-19-21-19919


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