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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 19, Iss. 24 — Nov. 21, 2011
  • pp: 24361–24369

Fabrication of a dual-layer aluminum nanowires polarization filter array

Viktor Gruev  »View Author Affiliations

Optics Express, Vol. 19, Issue 24, pp. 24361-24369 (2011)

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In this paper we present a procedure for fabricating an array of micropolarization filter array via an optimized interference lithography and microfabrication procedure. The filter array is composed of two linear polarization filters offset by 45 degrees with pixel pitch of 18 microns. The individual polarization filters are composed of aluminum nanowires with 140 nm pitch, 140 nm height and 70 nm width. The maximum extinction ratio of the pixelated filters is measured to be 95 at 700nm wavelength.

© 2011 OSA

OCIS Codes
(120.5410) Instrumentation, measurement, and metrology : Polarimetry
(230.5440) Optical devices : Polarization-selective devices
(260.5430) Physical optics : Polarization
(110.5405) Imaging systems : Polarimetric imaging

ToC Category:
Instrumentation, Measurement, and Metrology

Original Manuscript: September 22, 2011
Revised Manuscript: November 3, 2011
Manuscript Accepted: November 3, 2011
Published: November 14, 2011

Viktor Gruev, "Fabrication of a dual-layer aluminum nanowires polarization filter array," Opt. Express 19, 24361-24369 (2011)

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