OSA's Digital Library

Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 19, Iss. 24 — Nov. 21, 2011
  • pp: 24361–24369

Fabrication of a dual-layer aluminum nanowires polarization filter array

Viktor Gruev  »View Author Affiliations


Optics Express, Vol. 19, Issue 24, pp. 24361-24369 (2011)
http://dx.doi.org/10.1364/OE.19.024361


View Full Text Article

Enhanced HTML    Acrobat PDF (1733 KB)





Browse Journals / Lookup Meetings

Browse by Journal and Year


   


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools

Share
Citations

Abstract

In this paper we present a procedure for fabricating an array of micropolarization filter array via an optimized interference lithography and microfabrication procedure. The filter array is composed of two linear polarization filters offset by 45 degrees with pixel pitch of 18 microns. The individual polarization filters are composed of aluminum nanowires with 140 nm pitch, 140 nm height and 70 nm width. The maximum extinction ratio of the pixelated filters is measured to be 95 at 700nm wavelength.

© 2011 OSA

OCIS Codes
(120.5410) Instrumentation, measurement, and metrology : Polarimetry
(230.5440) Optical devices : Polarization-selective devices
(260.5430) Physical optics : Polarization
(110.5405) Imaging systems : Polarimetric imaging

ToC Category:
Instrumentation, Measurement, and Metrology

History
Original Manuscript: September 22, 2011
Revised Manuscript: November 3, 2011
Manuscript Accepted: November 3, 2011
Published: November 14, 2011

Citation
Viktor Gruev, "Fabrication of a dual-layer aluminum nanowires polarization filter array," Opt. Express 19, 24361-24369 (2011)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-19-24-24361


Sort:  Author  |  Year  |  Journal  |  Reset  

References

  1. J. Wang, F. Walters, X. Liu, P. Sciortino, and X. Deng, “High-performance, large area, deep ultraviolet to infrared polarizers based on 40 nm line/78 nm space nanowire grids,” Appl. Phys. Lett. 90, 061104.1–061104.3 (2007).
  2. T. Weber, T. Käsebier, E. B. Kley, and A. Tünnermann, “Broadband iridium wire grid polarizer for UV applications,” Opt. Lett. 36(4), 445–447 (2011). [CrossRef] [PubMed]
  3. J. G. Ok, H. J. Park, M. K. Kwak, C. A. Pina-Hernandez, S. H. Ahn, and L. J. Guo, “Continuous patterning of nanogratings by nanochannel-guided lithography on liquid resists,” Adv. Mater. (Deerfield Beach Fla.) 23(38), 4444–4448 (2011). [CrossRef] [PubMed]
  4. V. Gruev, R. Perkins, and T. York, “CCD polarization imaging sensor with aluminum nanowire optical filters,” Opt. Express 18(18), 19087–19094 (2010). [CrossRef] [PubMed]
  5. R. Perkins and V. Gruev, “Signal-to-noise analysis of Stokes parameters in division of focal plane polarimeters,” Opt. Express 18(25), 25815–25824 (2010). [CrossRef] [PubMed]
  6. V. Gruev, J. Van der Spiegel, and N. Engheta, “Dual-tier thin film polymer polarization imaging sensor,” Opt. Express 18(18), 19292–19303 (2010). [CrossRef] [PubMed]
  7. M. Momeni and A. H. Titus, “An analog VLSI chip emulating polarization vision of Octopus retina,” IEEE Trans. Neural Netw. 17(1), 222–232 (2006). [CrossRef] [PubMed]
  8. T. Tokuda, S. Sato, H. Yamada, K. Sasagawa, and J. Ohta, “Polarisation-analysing CMOS photosensor with monolithically embedded wire grid polarizer,” Electron. Lett. 45(4), 228–230 (2009). [CrossRef]
  9. X. Zhao, F. Boussaid, A. Bermak, and V. G. Chigrinov, “Thin Photo-Patterned Micropolarizer Array for CMOS Image Sensors,” IEEE Photon. Technol. Lett. 21(12), 805–807 (2009). [CrossRef]
  10. B. E. Bayer, Color Imaging Array U.S. Patent 3,971,065, (July 20, 1976).
  11. G. P. Nordin, J. T. Meier, P. C. Deguzman, and M. W. Jones, “Micropolarizer array for infrared imaging polarimetry,” J. Opt. Soc. Am. A 16(5), 1168–1174 (1999). [CrossRef]
  12. S. Franssila, Introduction to Microfabrication (John Wiley & Sons, West Sussex, UK, 2010).
  13. J. S. Tyo, “Optimum linear combination strategy for an N-channel polarization-sensitive imaging or vision system,” J. Opt. Soc. Am. A 15(2), 359–366 (1998). [CrossRef]
  14. M. L. Schattenburg, R. J. Aucoin, and R. C. Fleming, “Optically matched trilevel resist process for nanostructure fabrication,” J. Vac. Sci. Technol. B 13(6), 3007–3011 (1995). [CrossRef]
  15. V. Gruev, Z. Yang, J. Van der Spiegel, and R. Etienne-Cummings, “Current mode image sensor with two transistors per pixel,” IEEE Trans. Circuits Syst. I: Fundam. Theory Appl. 57(6), 1154–1165 (2010). [CrossRef]
  16. http:\\ www.opalkelly.com .

Cited By

Alert me when this paper is cited

OSA is able to provide readers links to articles that cite this paper by participating in CrossRef's Cited-By Linking service. CrossRef includes content from more than 3000 publishers and societies. In addition to listing OSA journal articles that cite this paper, citing articles from other participating publishers will also be listed.


« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited