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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 19, Iss. 24 — Nov. 21, 2011
  • pp: 24738–24745

Sub-surface channels in sapphire made by ultraviolet picosecond laser irradiation and selective etching

Rüdiger Moser, Nirdesh Ojha, Michael Kunzer, and Ulrich T. Schwarz  »View Author Affiliations

Optics Express, Vol. 19, Issue 24, pp. 24738-24745 (2011)

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We demonstrate the realization of sub-surface channels in sapphire prepared by ultraviolet picosecond laser irradiation and subsequent selective wet etching. By optimizing the pulse energy and the separation between individual laser pulses, an optimization of channel length can be achieved with an aspect ratio as high as 3200. Due to strong variation in channel length, further investigation was done to improve the reproducibility. By multiple irradiations the standard deviation of the channel length could be reduced to 2.2%. The achieved channel length together with the high reproducibility and the use of a commercial picosecond laser system makes the process attractive for industrial application.

© 2011 OSA

OCIS Codes
(220.4000) Optical design and fabrication : Microstructure fabrication
(220.4610) Optical design and fabrication : Optical fabrication
(260.7190) Physical optics : Ultraviolet
(320.5390) Ultrafast optics : Picosecond phenomena
(320.7130) Ultrafast optics : Ultrafast processes in condensed matter, including semiconductors

ToC Category:
Laser Microfabrication

Original Manuscript: September 16, 2011
Revised Manuscript: October 20, 2011
Manuscript Accepted: October 20, 2011
Published: November 17, 2011

Rüdiger Moser, Nirdesh Ojha, Michael Kunzer, and Ulrich T. Schwarz, "Sub-surface channels in sapphire made by ultraviolet picosecond laser irradiation and selective etching," Opt. Express 19, 24738-24745 (2011)

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