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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 19, Iss. 25 — Dec. 5, 2011
  • pp: 25255–25262

Bound exciton photoluminescence from ion‑implanted phosphorus in thin silicon layers

Hisashi Sumikura, Katsuhiko Nishiguchi, Yukinori Ono, Akira Fujiwara, and Masaya Notomi  »View Author Affiliations


Optics Express, Vol. 19, Issue 25, pp. 25255-25262 (2011)
http://dx.doi.org/10.1364/OE.19.025255


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Abstract

We report the observation of clear bound exciton (BE) emission from ion-implanted phosphorus. Shallow implantation and high-temperature annealing successfully introduce active donors into thin silicon layers. The BE emission at a wavelength of 1079 nm shows that a part of the implanted donors are definitely activated and isolated from each other. However, photoluminescence and electron spin resonance studies find a cluster state of the activated donors. The BE emission is suppressed by this cluster state rather than the nonradiative processes caused by ion implantation. Our results provide important information about ion implantation for doping quantum devices with phosphorus quantum bits.

© 2011 OSA

OCIS Codes
(300.6470) Spectroscopy : Spectroscopy, semiconductors
(310.6860) Thin films : Thin films, optical properties

ToC Category:
Spectroscopy

History
Original Manuscript: August 22, 2011
Revised Manuscript: September 26, 2011
Manuscript Accepted: September 30, 2011
Published: November 23, 2011

Citation
Hisashi Sumikura, Katsuhiko Nishiguchi, Yukinori Ono, Akira Fujiwara, and Masaya Notomi, "Bound exciton photoluminescence from ion‑implanted phosphorus in thin silicon layers," Opt. Express 19, 25255-25262 (2011)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-19-25-25255


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