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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 19, Iss. 27 — Dec. 19, 2011
  • pp: 26859–26865

Photosensitivity and stress changes of Ge-free Bi-Al doped silica optical fibers under ArF excimer laser irradiation

Christian Ban, Hans G. Limberger, Valery Mashinsky, and Evgeny Dianov  »View Author Affiliations


Optics Express, Vol. 19, Issue 27, pp. 26859-26865 (2011)
http://dx.doi.org/10.1364/OE.19.026859


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Abstract

The photosensitivity of germanium free Bi-Al-doped silica fibers with different bismuth concentrations was investigated using ArF excimer laser radiation at 193 nm and fiber grating formation. For the fiber with the highest bismuth concentration maximum refractive index changes of 2.2 × 10−3 and 2.0 × 10−4 were obtained for hydrogen loaded and unloaded fibers, respectively. Irradiation induced tensile stress changes were observed in the fiber core of H2-loaded and unloaded fibers. The results indicate a contribution of compaction to the total refractive index change in both cases.

© 2011 OSA

OCIS Codes
(060.3738) Fiber optics and optical communications : Fiber Bragg gratings, photosensitivity
(060.3510) Fiber optics and optical communications : Lasers, fiber

ToC Category:
Fiber Optics and Optical Communications

History
Original Manuscript: October 28, 2011
Revised Manuscript: December 5, 2011
Manuscript Accepted: December 5, 2011
Published: December 15, 2011

Citation
Christian Ban, Hans G. Limberger, Valery Mashinsky, and Evgeny Dianov, "Photosensitivity and stress changes of Ge-free Bi-Al doped silica optical fibers under ArF excimer laser irradiation," Opt. Express 19, 26859-26865 (2011)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-19-27-26859


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