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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 19, Iss. 4 — Feb. 14, 2011
  • pp: 3163–3174

Ultra-low-loss high-aspect-ratio Si3N4 waveguides

Jared F. Bauters, Martijn J. R. Heck, Demis John, Daoxin Dai, Ming-Chun Tien, Jonathon S. Barton, Arne Leinse, René G. Heideman, Daniel J. Blumenthal, and John E. Bowers  »View Author Affiliations


Optics Express, Vol. 19, Issue 4, pp. 3163-3174 (2011)
http://dx.doi.org/10.1364/OE.19.003163


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Abstract

We characterize an approach to make ultra-low-loss waveguides using stable and reproducible stoichiometric Si3N4 deposited with low-pressure chemical vapor deposition. Using a high-aspect-ratio core geometry, record low losses of 8-9 dB/m for a 0.5 mm bend radius down to 3 dB/m for a 2 mm bend radius are measured with ring resonator and optical frequency domain reflectometry techniques. From a waveguide loss model that agrees well with experimental results, we project that 0.1 dB/m total propagation loss is achievable at a 7 mm bend radius with this approach.

© 2011 OSA

OCIS Codes
(130.0130) Integrated optics : Integrated optics
(230.7390) Optical devices : Waveguides, planar

ToC Category:
Integrated Optics

History
Original Manuscript: October 13, 2010
Revised Manuscript: December 9, 2010
Manuscript Accepted: December 13, 2010
Published: February 3, 2011

Citation
Jared F. Bauters, Martijn J. R. Heck, Demis John, Daoxin Dai, Ming-Chun Tien, Jonathon S. Barton, Arne Leinse, René G. Heideman, Daniel J. Blumenthal, and John E. Bowers, "Ultra-low-loss high-aspect-ratio Si3N4 waveguides," Opt. Express 19, 3163-3174 (2011)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-19-4-3163


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