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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 19, Iss. 5 — Feb. 28, 2011
  • pp: 4560–4565

Efficient multi-keV x-ray generation from a high-Z target irradiated with a clean ultra-short laser pulse

Z. Zhang, M. Nishikino, H. Nishimura, T. Kawachi, A. S. Pirozhkov, A. Sagisaka, S. Orimo, K. Ogura, A. Yogo, Y. Okano, S. Ohshima, A. Sunahara, S. Fujioka, H. Kiriyama, K. Kondo, T. Shimomura, and S. Kanazawa  »View Author Affiliations


Optics Express, Vol. 19, Issue 5, pp. 4560-4565 (2011)
http://dx.doi.org/10.1364/OE.19.004560


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Abstract

line emissions from Mo and Ag plates were experimentally studied using clean, ultrahigh-intensity femtosecond laser pulses. The absolute yields of x-rays at 17 keV from Mo and 22 keV from Ag were measured as a function of the laser pulse contrast ratio and irradiation intensity. Significantly enhanced yields were obtained for both Mo and Ag by employing high contrast ratios and irradiances. Conversion efficiencies of 4.28 × 10−5 /sr for Mo and 4.84 × 10−5 /sr for Ag, the highest values obtained to date, were demonstrated with contrast ratios in the range 10−10 to 10−11.

© 2011 Optical Society of America

OCIS Codes
(140.7090) Lasers and laser optics : Ultrafast lasers
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)
(350.5400) Other areas of optics : Plasmas

ToC Category:
X-ray Optics

History
Original Manuscript: October 28, 2010
Revised Manuscript: December 13, 2010
Manuscript Accepted: January 19, 2011
Published: February 24, 2011

Citation
Z. Zhang, M. Nishikino, H. Nishimura, T. Kawachi, A. S. Pirozhkov, A. Sagisaka, S. Orimo, K. Ogura, A. Yogo, Y. Okano, S. Ohshima, S. Fujioka, H. Kiriyama, K. Kondo, T. Shimomura, and S. Kanazawa, "Efficient multi-keV x-ray generation from a high-Z target irradiated with a clean ultra-short laser pulse," Opt. Express 19, 4560-4565 (2011)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-19-5-4560


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