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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 19, Iss. 6 — Mar. 14, 2011
  • pp: 5511–5521

Robust level-set-based inverse lithography

Yijiang Shen, Ningning Jia, Ngai Wong, and Edmund Y. Lam  »View Author Affiliations


Optics Express, Vol. 19, Issue 6, pp. 5511-5521 (2011)
http://dx.doi.org/10.1364/OE.19.005511


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Abstract

Level-set based inverse lithography technology (ILT) treats photomask design for microlithography as an inverse mathematical problem, interpreted with a time-dependent model, and then solved as a partial differential equation with finite difference schemes. This paper focuses on developing level-set based ILT for partially coherent systems, and upon that an expectation-orient optimization framework weighting the cost function by random process condition variables. These include defocus and aberration to enhance robustness of layout patterns against process variations. Results demonstrating the benefits of defocus-aberration-aware level-set based ILT are presented.

© 2011 Optical Society of America

OCIS Codes
(110.3960) Imaging systems : Microlithography
(110.5220) Imaging systems : Photolithography
(110.1758) Imaging systems : Computational imaging

ToC Category:
Imaging Systems

History
Original Manuscript: January 10, 2011
Revised Manuscript: February 17, 2011
Manuscript Accepted: February 18, 2011
Published: March 9, 2011

Citation
Yijiang Shen, Ningning Jia, Ngai Wong, and Edmund Y. Lam, "Robust level-set-based inverse lithography," Opt. Express 19, 5511-5521 (2011)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-19-6-5511


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