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Optics Express

Optics Express

  • Editor: C. Martijin de Sterke
  • Vol. 19, Iss. 7 — Mar. 28, 2011
  • pp: 6439–6449

High resolution characterization of modifications in fused silica after exposure to low fluence 355 nm laser at different repetition frequencies

C. H. Li, X. Ju, X. D. Jiang, J. Huang, X. D. Zhou, Z. Zheng, W. D. Wu, W. G. Zheng, Z. X. Li, B. Y. Wang, and X. H. Yu  »View Author Affiliations


Optics Express, Vol. 19, Issue 7, pp. 6439-6449 (2011)
http://dx.doi.org/10.1364/OE.19.006439


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Abstract

We report on the characterization of modifications in fused silica after exposure to low fluence (2 J/cm2) 355 nm laser at repetition frequencies of 1 Hz, 5 Hz and 10 Hz. Synchrotron based XRF spectroscopy is employed to study concentration variation of metal inclusions in the surface layer. Positron annihilation lifetime spectroscopy is used to probe atomic size defects variation in bulk silica. FT-IR is used to characterize changes of bond length and angle of Si-O-Si covalent bond of irradiated silica. Compared to the basic frequency, the big loss of cerium and iron concentration, the size enlargement of vacancy cluster and the decrease of Si-O-Si covalent bond length after 10 Hz laser irradiation are illustrated by our data. These tiny modifications provide important data to investigate laser damage mechanism.

© 2011 OSA

OCIS Codes
(140.3330) Lasers and laser optics : Laser damage
(160.6030) Materials : Silica

ToC Category:
Materials

History
Original Manuscript: October 28, 2010
Revised Manuscript: December 15, 2010
Manuscript Accepted: January 5, 2011
Published: March 22, 2011

Citation
C. H. Li, X. Ju, X. D. Jiang, J. Huang, X. D. Zhou, Z. Zheng, W. D. Wu, W. G. Zheng, Z. X. Li, B. Y. Wang, and X. H. Yu, "High resolution characterization of modifications in fused silica after exposure to low fluence 355 nm laser at different repetition frequencies," Opt. Express 19, 6439-6449 (2011)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-19-7-6439


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