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Optics Express

Optics Express

  • Editor: C. Martijin de Sterke
  • Vol. 19, Iss. 7 — Mar. 28, 2011
  • pp: 6714–6723

Tunable ultra-deep subwavelength photolithography using a surface plasmon resonant cavity

Weihao Ge, Chinhua Wang, Yinfei Xue, Bing Cao, Baoshun Zhang, and Ke Xu  »View Author Affiliations

Optics Express, Vol. 19, Issue 7, pp. 6714-6723 (2011)

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Using numerical simulations, we report an observation of a novel tunable ultra-deep subwavelength nanolithography technique using a surface plasmon resonant cavity formed by a metallic grating and a metallic thin-film layer separated by a photoresist layer. The tuning capability is implemented by varying the cavity length, from which surface plasmon interferometric patterns with inherently higher optical resolution than that of conventional surface plasmon techniques are generated in the cavity of photoresist layer. The physical origin of the tunability is analytically confirmed by the dispersion relation derived from the cavity system.

© 2011 OSA

OCIS Codes
(240.6680) Optics at surfaces : Surface plasmons
(110.4235) Imaging systems : Nanolithography
(050.6624) Diffraction and gratings : Subwavelength structures

ToC Category:
Optics at Surfaces

Original Manuscript: January 7, 2011
Revised Manuscript: March 7, 2011
Manuscript Accepted: March 13, 2011
Published: March 24, 2011

Weihao Ge, Chinhua Wang, Yinfei Xue, Bing Cao, Baoshun Zhang, and Ke Xu, "Tunable ultra-deep subwavelength photolithography using a surface plasmon resonant cavity," Opt. Express 19, 6714-6723 (2011)

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