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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 19, Iss. 9 — Apr. 25, 2011
  • pp: 8888–8902

Silicon-based horizontal nanoplasmonic slot waveguides for on-chip integration

Shiyang Zhu, T. Y. Liow, G. Q. Lo, and D. L. Kwong  »View Author Affiliations

Optics Express, Vol. 19, Issue 9, pp. 8888-8902 (2011)

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Horizontal metal/insulator/Si/insulator/metal nanoplasmonic slot waveguide (PWG), which is inserted in a conventional Si wire waveguide, is fabricated using the standard Si-CMOS technology. A thin insulator between the metal and the Si core plays a key role: it not only increases the propagation distance as the theoretical prediction, but also prevents metal diffusion and/or metal-Si reaction. Cu-PWGs with the Si core width of ~134–21 nm and ~12-nm-thick SiO2 on each side exhibit a relatively low propagation loss of ~0.37–0.63 dB/µm around the telecommunication wavelength of 1550 nm, which is ~2.6 times smaller than the Al-counterparts. A simple tapered coupler can provide an effective coupling between the PWG and the conventional Si wire waveguide. The coupling efficiency as high as ~0.1–0.4 dB per facet is measured. The PWG allows a sharp bending. The pure bending loss of a Cu-PWG direct 90° bend is measured to be ~0.6–1.0 dB. These results indicate the potential for seamless integration of various functional nanoplasmonic devices in existing Si electronic photonic integrated circuits (Si-EPICs).

© 2011 OSA

OCIS Codes
(230.7370) Optical devices : Waveguides
(240.6680) Optics at surfaces : Surface plasmons
(250.5300) Optoelectronics : Photonic integrated circuits
(250.5403) Optoelectronics : Plasmonics

ToC Category:
Integrated Optics

Original Manuscript: February 18, 2011
Revised Manuscript: March 16, 2011
Manuscript Accepted: March 16, 2011
Published: April 22, 2011

Shiyang Zhu, T. Y. Liow, G. Q. Lo, and D. L. Kwong, "Silicon-based horizontal nanoplasmonic slot waveguides for on-chip integration," Opt. Express 19, 8888-8902 (2011)

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