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Energy Express

  • Editor: Bernard Kippelen
  • Vol. 19, Iss. S5 — Sep. 12, 2011
  • pp: A1031–A1036

Antireflection effect of femtosecond laser-induced periodic surface structures on silicon

A. Y. Vorobyev and Chunlei Guo  »View Author Affiliations

Optics Express, Vol. 19, Issue S5, pp. A1031-A1036 (2011)

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Following direct femtosecond laser pulse irradiation, we produce a unique grating structure over a large area superimposed by finer nanostructures on a silicon wafer. We study, for the first time, the antireflection effect of this femtosecond laser-induced periodic surface structures (FLIPSSs) in the wavelength range of 250 - 2500 nm. Our study shows that the FLIPSSs suppress both the total hemispherical and specular polarized reflectance of silicon surface significantly over the entire studied wavelength range. The total polarized reflectance of the processed surface is reduced by a factor of about 3.5 in the visible and 7 in the UV compared to an untreated sample. The antireflection effect of the FLIPSS surface is broadband and the suppression stays to the longest wavelength (2500 nm) studied here although the antireflection effect in the infrared is weaker than in the visible. Our FLIPSS structures are free of chemical contamination, highly durable, and easily controllable in size.

© 2011 OSA

OCIS Codes
(140.3390) Lasers and laser optics : Laser materials processing
(160.0160) Materials : Materials
(160.6000) Materials : Semiconductor materials
(230.4000) Optical devices : Microstructure fabrication
(220.4241) Optical design and fabrication : Nanostructure fabrication

ToC Category:

Original Manuscript: March 18, 2011
Revised Manuscript: June 16, 2011
Manuscript Accepted: June 17, 2011
Published: July 15, 2011

A. Y. Vorobyev and Chunlei Guo, "Antireflection effect of femtosecond laser-induced periodic surface structures on silicon," Opt. Express 19, A1031-A1036 (2011)

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