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Optical and structural performance of the Al(1%wtSi)/Zr reflection multilayers in the 17–19nm region |
Optics Express, Vol. 20, Issue 10, pp. 10692-10700 (2012)
http://dx.doi.org/10.1364/OE.20.010692
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Abstract
Two kinds of Al/Zr (Al(1%wtSi)/Zr and Al(Pure)/Zr) multilayers for extreme ultraviolet (EUV) optics were deposited on fluorine doped tin oxide coated glass by using direct–current magnetron sputtering technology. The comparison of the two systems shows that the Al(1%wtSi)/Zr multilayers have the lowest interfacial roughness and highest reflectivity. Based on the X–ray diffraction, the performance of the two systems is determined by the crystallization of Al layer. To fully understand the Al(1%wtSi)/Zr multilayer, we built up a two–layer model to fit situation of the AFM images, and simulate the grazing incident x–ray reflection-measurements of multilayers with various periods (N = 10, 40, 60, 80). Below 40 periods, the roughness components are lowered. After 40 periods, both surface and interfacial roughness increase with the period number, and decrease the reflectance. According to transmission electron microscope images, the model can represent the variable structure of the system.
© 2012 OSA
OCIS Codes
(310.6860) Thin films : Thin films, optical properties
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)
ToC Category:
X-ray Optics
History
Original Manuscript: March 16, 2012
Revised Manuscript: April 15, 2012
Manuscript Accepted: April 15, 2012
Published: April 24, 2012
Citation
Qi Zhong, Wenbin Li, Zhong Zhang, Jingtao Zhu, Qiushi Huang, Haochuan Li, Zhanshan Wang, Philippe Jonnard, Karine Le Guen, Jean-Michel André, Hongjun Zhou, and Tonglin Huo, "Optical and structural performance of the Al(1%wtSi)/Zr reflection multilayers in the 17–19nm region," Opt. Express 20, 10692-10700 (2012)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-20-10-10692
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