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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 20, Iss. 12 — Jun. 4, 2012
  • pp: 13091–13099

Fabrication of semiconductor-polymer compound nonlinear photonic crystal slab with highly uniform infiltration based on nano-imprint lithography technique

Fei Qin, Zi-Ming Meng, Xiao-Lan Zhong, Ye Liu, and Zhi-Yuan Li  »View Author Affiliations

Optics Express, Vol. 20, Issue 12, pp. 13091-13099 (2012)

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We present a versatile technique based on nano-imprint lithography to fabricate high-quality semiconductor-polymer compound nonlinear photonic crystal (NPC) slabs. The approach allows one to infiltrate uniformly polystyrene materials that possess large Kerr nonlinearity and ultrafast nonlinear response into the cylindrical air holes with diameter of hundred nanometers that are perforated in silicon membranes. Both the structural characterization via the cross-sectional scanning electron microscopy images and the optical characterization via the transmission spectrum measurement undoubtedly show that the fabricated compound NPC samples have uniform and dense polymer infiltration and are of high quality in optical properties. The compound NPC samples exhibit sharp transmission band edges and nondegraded high quality factor of microcavities compared with those in the bare silicon PC. The versatile method can be expanded to make general semiconductor-polymer hybrid optical nanostructures, and thus it may pave the way for reliable and efficient fabrication of ultrafast and ultralow power all-optical tunable integrated photonic devices and circuits

© 2012 OSA

OCIS Codes
(190.4390) Nonlinear optics : Nonlinear optics, integrated optics
(230.1150) Optical devices : All-optical devices
(110.4235) Imaging systems : Nanolithography
(230.5298) Optical devices : Photonic crystals

ToC Category:
Photonic Crystals

Original Manuscript: February 27, 2012
Revised Manuscript: April 21, 2012
Manuscript Accepted: April 23, 2012
Published: May 25, 2012

Fei Qin, Zi-Ming Meng, Xiao-Lan Zhong, Ye Liu, and Zhi-Yuan Li, "Fabrication of semiconductor-polymer compound nonlinear photonic crystal slab with highly uniform infiltration based on nano-imprint lithography technique," Opt. Express 20, 13091-13099 (2012)

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