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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 20, Iss. 14 — Jul. 2, 2012
  • pp: 14848–14856

Mechanism of femtosecond-laser-induced periodic nanostructure formation on crystalline silicon surface immersed in water

Godai Miyaji, Kenzo Miyazaki, Kaifeng Zhang, Takakazu Yoshifuji, and Junya Fujita  »View Author Affiliations

Optics Express, Vol. 20, Issue 14, pp. 14848-14856 (2012)

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Focused on silicon surface in water, superimposed multiple shots of linearly polarized 800-nm, 100-fs, 10-Hz laser pulses at lower fluence than the single-pulse ablation threshold are shown to produce two kinds of periodic nanostructures with almost constant periods of 150 nm and 400 nm. Surface plasmon polaritons excited in the surface layer illustrates well the formation of nanostructures and its dynamic properties observed. Pump and probe measurements of the ultrafast change in surface reflectivity during the interaction have demonstrated that the multiple low-fluence fs pulses are crucial to the nanostructuring through the accumulation of non-thermal bonding structure change and the subsequent nanoscale ablation.

© 2012 OSA

OCIS Codes
(320.2250) Ultrafast optics : Femtosecond phenomena
(350.3390) Other areas of optics : Laser materials processing
(220.4241) Optical design and fabrication : Nanostructure fabrication

ToC Category:
Laser Microfabrication

Original Manuscript: May 9, 2012
Revised Manuscript: June 5, 2012
Manuscript Accepted: June 6, 2012
Published: June 18, 2012

Godai Miyaji, Kenzo Miyazaki, Kaifeng Zhang, Takakazu Yoshifuji, and Junya Fujita, "Mechanism of femtosecond-laser-induced periodic nanostructure formation on crystalline silicon surface immersed in water," Opt. Express 20, 14848-14856 (2012)

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