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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 20, Iss. 14 — Jul. 2, 2012
  • pp: 15547–15558

Optics InfoBase > Optics Express > Volume 20 > Issue 14 > Page 15547

Narrow-band waveguide Bragg gratings on SOI wafers with CMOS-compatible fabrication process

Xu Wang, Wei Shi, Han Yun, Samantha Grist, Nicolas A. F. Jaeger, and Lukas Chrostowski  »View Author Affiliations


Optics Express, Vol. 20, Issue 14, pp. 15547-15558 (2012)
http://dx.doi.org/10.1364/OE.20.015547


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Abstract

We demonstrate the design, fabrication and measurement of integrated Bragg gratings in a compact single-mode silicon-on-insulator ridge waveguide. The gratings are realized by corrugating the sidewalls of the waveguide, either on the ridge or on the slab. The coupling coefficient is varied by changing the corrugation width which allows precise control of the bandwidth and has a high fabrication tolerance. The grating devices are fabricated using a CMOS-compatible process with 193 nm deep ultraviolet lithography. Spectral measurements show bandwidths as narrow as 0.4 nm, which are promising for on-chip applications that require narrow bandwidths such as WDM channel filters. We also present the die-to-die nonuniformity for the grating devices on the wafer, and our analysis shows that the Bragg wavelength deviation is mainly caused by the wafer thickness variation.

© 2012 OSA

OCIS Codes
(050.2770) Diffraction and gratings : Gratings
(130.3120) Integrated optics : Integrated optics devices
(230.7370) Optical devices : Waveguides

ToC Category:
Integrated Optics

History
Original Manuscript: April 16, 2012
Revised Manuscript: June 12, 2012
Manuscript Accepted: June 13, 2012
Published: June 26, 2012

Citation
Xu Wang, Wei Shi, Han Yun, Samantha Grist, Nicolas A. F. Jaeger, and Lukas Chrostowski, "Narrow-band waveguide Bragg gratings on SOI wafers with CMOS-compatible fabrication process," Opt. Express 20, 15547-15558 (2012)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-20-14-15547


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