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An analytic expression for the field dependence of Zernike polynomials in rotationally symmetric optical systems |
Optics Express, Vol. 20, Issue 15, pp. 16436-16449 (2012)
http://dx.doi.org/10.1364/OE.20.016436
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Abstract
Zernike polynomials have emerged as the preferred method of characterizing as-fabricated optical surfaces with circular apertures. Over time, they have come to be used as a sparsely sampled in field representation of the state of alignment of assembled optical systems both during and at the conclusion of the alignment process using interferometry. We show that the field dependence of the Zernike polynomial coefficients, which has to-date been characterized essentially by aperture dependence, can be introduced by association to the field dependent wave aberration function of H.H. Hopkins.
© 2012 OSA
OCIS Codes
(080.2740) Geometric optics : Geometric optical design
(120.3180) Instrumentation, measurement, and metrology : Interferometry
(080.1005) Geometric optics : Aberration expansions
ToC Category:
Geometric Optics
History
Original Manuscript: April 25, 2012
Revised Manuscript: June 22, 2012
Manuscript Accepted: June 26, 2012
Published: July 5, 2012
Citation
Robert W. Gray, Christina Dunn, Kevin P. Thompson, and Jannick P. Rolland, "An analytic expression for the field dependence of Zernike polynomials in rotationally symmetric optical systems," Opt. Express 20, 16436-16449 (2012)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-20-15-16436
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References
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