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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 20, Iss. 15 — Jul. 16, 2012
  • pp: 16684–16689

Arbitrary photo-patterning in liquid crystal alignments using DMD based lithography system

Hao Wu, Wei Hu, Hua-chao Hu, Xiao-wen Lin, Ge Zhu, Jae-Won Choi, Vladimir Chigrinov, and Yan-qing Lu  »View Author Affiliations


Optics Express, Vol. 20, Issue 15, pp. 16684-16689 (2012)
http://dx.doi.org/10.1364/OE.20.016684


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Abstract

We propose and implement a technique for arbitrary pattern fabrication in liquid crystal (LC) alignments and local polarization control for light wavefront. A micro-lithography system with a digital micro-mirror device as dynamic mask forms arbitrary micro-images on photoalignment layers and further guides the LC molecule orientations. Besides normal phase gratings, more complex 2D patterns such as quasicrystal and checkerboard structures are demonstrated. To characterize the optical performances of the fabricated structures, the electro-optically tunable diffraction patterns and efficiencies are demonstrated in several 1D/2D phase gratings. Compared to other techniques, our method enables the arbitrary and instant manipulation of LC alignments and light polarization states, facilitating wide applications in display and photonic fields.

© 2012 OSA

OCIS Codes
(110.3960) Imaging systems : Microlithography
(160.3710) Materials : Liquid crystals

ToC Category:
Optical Devices

History
Original Manuscript: May 11, 2012
Revised Manuscript: June 28, 2012
Manuscript Accepted: June 29, 2012
Published: July 9, 2012

Citation
Hao Wu, Wei Hu, Hua-chao Hu, Xiao-wen Lin, Ge Zhu, Jae-Won Choi, Vladimir Chigrinov, and Yan-qing Lu, "Arbitrary photo-patterning in liquid crystal alignments using DMD based lithography system," Opt. Express 20, 16684-16689 (2012)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-20-15-16684


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