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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 20, Iss. 15 — Jul. 16, 2012
  • pp: 16871–16879

Dynamic modeling of superresolution photoinduced-inhibition nanolithography

Zongsong Gan, Yaoyu Cao, Baohua Jia, and Min Gu  »View Author Affiliations


Optics Express, Vol. 20, Issue 15, pp. 16871-16879 (2012)
http://dx.doi.org/10.1364/OE.20.016871


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Abstract

A dynamical model based on the photo-physics and photo-chemistry processes for superresolution photoinduced-inhibition nanolithography (SPIN) under both single-photon and two-photon excitation is developed and validated by experimental results. Numerical simulation results for the dot fabrication predict that the theoretical single dot size can be infinitely reduced, which shows diffraction-unlimited feature of the SPIN. A small reaction constant of the inhibitor polymerization is crucial to realize a small dot size and high resolution. It is discovered both theoretically and experimentally that the dot minimum size and best resolution occur under different inhibition beam powers because of the influence from the inhibitor polymerization. Moreover, due to the consumption of the photo-inhibitor molecules in the inhibition process, the dot size may vary during the sequential fabrication.

© 2012 OSA

OCIS Codes
(000.4430) General : Numerical approximation and analysis
(140.3450) Lasers and laser optics : Laser-induced chemistry
(160.5470) Materials : Polymers
(220.4610) Optical design and fabrication : Optical fabrication
(220.4241) Optical design and fabrication : Nanostructure fabrication

ToC Category:
Optical Design and Fabrication

History
Original Manuscript: March 21, 2012
Revised Manuscript: July 1, 2012
Manuscript Accepted: July 5, 2012
Published: July 11, 2012

Citation
Zongsong Gan, Yaoyu Cao, Baohua Jia, and Min Gu, "Dynamic modeling of superresolution photoinduced-inhibition nanolithography," Opt. Express 20, 16871-16879 (2012)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-20-15-16871


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