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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 20, Iss. 16 — Jul. 30, 2012
  • pp: 18348–18355

Durability of stochastic antireflective structures - analyses on damage thresholds and adsorbate elimination

Marcel Schulze, Michael Damm, Michael Helgert, Ernst-Bernhard Kley, Stefan Nolte, and Andreas Tünnermann  »View Author Affiliations

Optics Express, Vol. 20, Issue 16, pp. 18348-18355 (2012)

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We fabricated stochastic antireflective structures (ARS) and analyzed their stability against high power laser irradiation and high temperature annealing. For 8 ps pulse duration and 1030 nm wavelength we experimentally determined their laser induced damage threshold to 4.9 (±0.3) J/cm2, which is nearly as high as bulk fused silica with 5.6 (±0.3) J/cm2. A commercial layer stack reached 2.0 (±0.2) J/cm2. An annealing process removed adsorbed organics, as shown by XPS measurements, and significantly increased the transmission of the ARS. Because of their monolithic build the ARS endure such high temperature treatments. For more sensitive samples an UV irradiation proved to be capable. It decreased the absorbed light and reinforced the transmission.

© 2012 OSA

OCIS Codes
(120.7000) Instrumentation, measurement, and metrology : Transmission
(140.3440) Lasers and laser optics : Laser-induced breakdown
(160.6030) Materials : Silica
(310.6628) Thin films : Subwavelength structures, nanostructures

ToC Category:
Laser Microfabrication

Original Manuscript: March 30, 2012
Manuscript Accepted: June 21, 2012
Published: July 26, 2012

Marcel Schulze, Michael Damm, Michael Helgert, Ernst-Bernhard Kley, Stefan Nolte, and Andreas Tünnermann, "Durability of stochastic antireflective structures - analyses on damage thresholds and adsorbate elimination," Opt. Express 20, 18348-18355 (2012)

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