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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 20, Iss. 17 — Aug. 13, 2012
  • pp: 19554–19562

Antireflective disordered subwavelength structure on GaAs using spin-coated Ag ink mask

Chan Il Yeo, Ji Hye Kwon, Sung Jun Jang, and Yong Tak Lee  »View Author Affiliations

Optics Express, Vol. 20, Issue 17, pp. 19554-19562 (2012)

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We present a simple, cost-effective, large scale fabrication technique for antireflective disordered subwavelength structures (d-SWSs) on GaAs substrate by Ag etch masks formed using spin-coated Ag ink and subsequent inductively coupled plasma (ICP) etching process. The antireflection characteristics of GaAs d-SWSs rely on their geometric profiles, which were controlled by adjusting the distribution of Ag etch masks via changing the concentration of Ag atoms and the sintering temperature of Ag ink as well as the ICP etching conditions. The fabricated GaAs d-SWSs drastically reduced the reflection loss compared to that of bulk GaAs (>30%) in the wavelength range of 300-870 nm. The most desirable GaAs d-SWSs for practical solar cell applications exhibited a solar-weighted reflectance (SWR) of 2.12%, which is much lower than that of bulk GaAs (38.6%), and its incident angle-dependent SWR was also investigated.

© 2012 OSA

OCIS Codes
(160.4760) Materials : Optical properties
(350.6050) Other areas of optics : Solar energy
(220.4241) Optical design and fabrication : Nanostructure fabrication
(310.6628) Thin films : Subwavelength structures, nanostructures

ToC Category:
Thin Films

Original Manuscript: June 22, 2012
Revised Manuscript: August 3, 2012
Manuscript Accepted: August 6, 2012
Published: August 10, 2012

Chan Il Yeo, Ji Hye Kwon, Sung Jun Jang, and Yong Tak Lee, "Antireflective disordered subwavelength structure on GaAs using spin-coated Ag ink mask," Opt. Express 20, 19554-19562 (2012)

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