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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 20, Iss. 18 — Aug. 27, 2012
  • pp: 19928–19935

Resonant metamaterials for contrast enhancement in optical lithography

Sabine Dobmann, Dzmitry Shyroki, Peter Banzer, Andreas Erdmann, and Ulf Peschel  »View Author Affiliations


Optics Express, Vol. 20, Issue 18, pp. 19928-19935 (2012)
http://dx.doi.org/10.1364/OE.20.019928


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Abstract

The transmission through ultra-thin metal films is noticeable and thus limits their potential for the formation of lithographic masks. By sub-wavelength patterning of a metal film with a post structure, a resonant metamaterial is formed, which can effectively suppress the transmission. Measurements as well as calculations identify the width of the metal islands as a critical geometrical feature. Hence, the extraordinarily low transmission effect can be explained by the resonant response of single scatterers known as Localized Surface Plasmon Resonances (LSPR). A potential application of this suppressed transmission effect to thin metal masks in optical lithography is experimentally investigated.

© 2012 OSA

OCIS Codes
(050.2770) Diffraction and gratings : Gratings
(220.3740) Optical design and fabrication : Lithography
(240.0310) Optics at surfaces : Thin films
(240.6680) Optics at surfaces : Surface plasmons

ToC Category:
Metamaterials

History
Original Manuscript: June 12, 2012
Revised Manuscript: July 15, 2012
Manuscript Accepted: July 16, 2012
Published: August 15, 2012

Citation
Sabine Dobmann, Dzmitry Shyroki, Peter Banzer, Andreas Erdmann, and Ulf Peschel, "Resonant metamaterials for contrast enhancement in optical lithography," Opt. Express 20, 19928-19935 (2012)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-20-18-19928


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