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Hotspot-aware fast source and mask optimizationJia Li, Yijiang Shen, and Edmund Y. Lam »View Author Affiliations
Jia Li,
Yijiang Shen,
and Edmund Y. Lam*
Imaging Systems Laboratory, Department of Electrical and Electronic Engineering, The University of Hong Kong, Pokfulam Road, Hong Kong, China *Corresponding author: elam@eee.hku.hk |
Optics Express, Vol. 20, Issue 19, pp. 21792-21804 (2012)
http://dx.doi.org/10.1364/OE.20.021792
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Abstract
Source mask optimization (SMO) is a useful technique for printing the integrated circuit (IC) on a wafer with increasingly smaller feature size. However, complex SMO algorithms generally lead to undesirably long runtime resulting from an optimization of largely identical regions over the whole mask pattern. In this work, a weighted SMO scheme incorporating both an awareness of the hotspots and robustness against process variations is proposed. We show how optimal solutions are reached with fewer iterations by applying various degrees of correction in the corresponding regions. The proposed method includes identifying the hotspots and combining a weight matrix to the cost function for adjustment and control. Simulation results are compared with the mask optimization (under a fixed source) and conventional SMO to illustrate the performance improvement in terms of pattern fidelity, convergence rate and process window size.
© 2012 OSA
OCIS Codes
(110.3960) Imaging systems : Microlithography
(110.5220) Imaging systems : Photolithography
(110.1758) Imaging systems : Computational imaging
ToC Category:
Imaging Systems
History
Original Manuscript: July 17, 2012
Revised Manuscript: September 2, 2012
Manuscript Accepted: September 3, 2012
Published: September 7, 2012
Citation
Jia Li, Yijiang Shen, and Edmund Y. Lam, "Hotspot-aware fast source and mask optimization," Opt. Express 20, 21792-21804 (2012)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-20-19-21792
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Adamov, A.
Adrichem, P. V.
Arce, G. R.
Bagheri, S.
Baik, K.-H.
Barahona, F.
Berger, G.
Bisschop, P. D.
Burkhardt, M.
Burr, G.
Capodieci, L.
Carpaij, R.
Chan, S. H.
Chao, H. Y.
Chen, D.
Chen, L.
Choy, S. K.
Cobb, N.
Corliss, D.
Coskun, T. H.
Dai, H.
Dam, T.
Dam, T. H.
Dave, A.
De Leone, R.
Deng, Y.
Domnenko, V.
Engelen, A.
Fakhry, M.
Fan, M.
Faure, T.
Flagello, D.
Gallagher, E.
Gleason, B.
Granik, Y.
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Gronlund, K.
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Hartung, F.
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Küchler, B.
Kye, J.
Ladanyi, L.
Laenens, B.
Lai, K.
Lam, E. Y.
Lam, M.
Lee, J.
Levinson, H. J.
Li, Z.
Liu, H.-Y.
Ma, X.
Ma, Y.
Manu, M.
McIntyre, G.
Meiring, J.
Melville, D.
Milanfar, P.
Mülders, T.
Muta, H.
Ngai, C.
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- K. Iwase, P. D. Bisschop, B. Laenens, Z. Li, K. Gronlund, P. V. Adrichem, and S. Hsu, “A new source optimization approach for 2X node logic,” in Photomask Technology 2011, W. Maurer and F. E. Abboud, eds., Proc. SPIE8166, 81662A (2011).
- K. Lai, A. E. Rosenbluth, S. Bagheri, J. Hoffnagle, K. Tian, D. Melville, J. Tirapu-Azpiroz, M. Fakhry, Y. Kim, S. Halle, G. McIntyre, A. Wagner, G. Burr, M. Burkhardt, D. Corliss, E. Gallagher, T. Faure, M. Hibbs, D. Flagello, J. Zimmermann, B. Kneer, F. Rohmund, F. Hartung, C. Hennerkes, M. Manu, R. Kazinczi, A. Engelen, R. Carpaij, R. Groenendijk, J. Hageman, and C. Russ, “Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process,” in Optical Microlithography XXIV, H. J. Levinson and M. V. Dusa eds., Proc. SPIE 7274, 72740A (2009).
- K. Lai, A. E. Rosenbluth, S. Bagheri, J. Hoffnagle, K. Tian, D. Melville, J. Tirapu-Azpiroz, M. Fakhry, Y. Kim, S. Halle, G. McIntyre, A. Wagner, G. Burr, M. Burkhardt, D. Corliss, E. Gallagher, T. Faure, M. Hibbs, D. Flagello, J. Zimmermann, B. Kneer, F. Rohmund, F. Hartung, C. Hennerkes, M. Manu, R. Kazinczi, A. Engelen, R. Carpaij, R. Groenendijk, J. Hageman, and C. Russ, “Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process,” in Optical Microlithography XXIV, H. J. Levinson and M. V. Dusa eds., Proc. SPIE 7274, 72740A (2009).
- D. Melville, A. Rosenbluth, K. Tian, K. Lai, S. Bagheri, J. Tirapu-Azpiroz, J. Meiring, S. Halle, G. McIntyre, T. Faure, D. Corliss, A. Krasnoperova, L. Zhuang, P. Strenski, A. Waechter, L. Ladanyi, F. Barahona, D. Scarpazza, J. Lee, T. Inoue, M. Sakamoto, H. Muta, A. Wagner, G. Burr, Y. Kim, E. Gallagher, M. Hibbs, A. Tritchkov, Y. Granik, M. Fakhry, K. Adam, G. Berger, M. Lam, A. Dave, and N. Cobb, “Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations,” in Optical Microlithography XXIII, M. V. Dusa and W. Conley, eds., Proc. SPIE 7640, 764006 (2010).
- Y. Deng, Y. Zou, K. Yoshimoto, Y. Ma, C. E. Tabery, J. Kye, L. Capodieci, and H. J. Levinson, “Considerations in source-mask optimization for logic applications,” in Optical Microlithography XXIII, M. V. Dusa and W. Conley, eds., Proc. SPIE 7640, 76401J (2010).
- K. Lai, A. E. Rosenbluth, S. Bagheri, J. Hoffnagle, K. Tian, D. Melville, J. Tirapu-Azpiroz, M. Fakhry, Y. Kim, S. Halle, G. McIntyre, A. Wagner, G. Burr, M. Burkhardt, D. Corliss, E. Gallagher, T. Faure, M. Hibbs, D. Flagello, J. Zimmermann, B. Kneer, F. Rohmund, F. Hartung, C. Hennerkes, M. Manu, R. Kazinczi, A. Engelen, R. Carpaij, R. Groenendijk, J. Hageman, and C. Russ, “Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process,” in Optical Microlithography XXIV, H. J. Levinson and M. V. Dusa eds., Proc. SPIE 7274, 72740A (2009).
- T. H. Dam, X. Zhou, D. Chen, A. Adamov, D. Peng, and B. Gleason, “Validation and application of a mask model for inverse lithography,” in Design for Manufacturability through Design-Process Integration II, V. K. Sing and M. L. Rieger eds., Proc. SPIE 6925, 69251J (2008).
- S. Hsu, Z. Li, L. Chen, K. Gronlund, H.-Y. Liu, and R. Socha, “Source-mask co-optimization: optimize design for imaging and impact of source complexity on lithography performance,” in Lithography Asia 2009, A. C. Chen, W.-S. Han, B. J. Lin, and A. Yen eds., Proc. SPIE 7520, 75200D (2009).
- S. K. Choy, N. Jia, C. S. Tong, M. L. Tang, and E. Y. Lam, “A robust computational algorithm for inverse photomask synthesis in optical projection lithography,” SIAM J. Imaging Sciences5, 625–651 (2012). [CrossRef]
- D. Melville, A. Rosenbluth, K. Tian, K. Lai, S. Bagheri, J. Tirapu-Azpiroz, J. Meiring, S. Halle, G. McIntyre, T. Faure, D. Corliss, A. Krasnoperova, L. Zhuang, P. Strenski, A. Waechter, L. Ladanyi, F. Barahona, D. Scarpazza, J. Lee, T. Inoue, M. Sakamoto, H. Muta, A. Wagner, G. Burr, Y. Kim, E. Gallagher, M. Hibbs, A. Tritchkov, Y. Granik, M. Fakhry, K. Adam, G. Berger, M. Lam, A. Dave, and N. Cobb, “Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations,” in Optical Microlithography XXIII, M. V. Dusa and W. Conley, eds., Proc. SPIE 7640, 764006 (2010).
- D. Melville, A. Rosenbluth, K. Tian, K. Lai, S. Bagheri, J. Tirapu-Azpiroz, J. Meiring, S. Halle, G. McIntyre, T. Faure, D. Corliss, A. Krasnoperova, L. Zhuang, P. Strenski, A. Waechter, L. Ladanyi, F. Barahona, D. Scarpazza, J. Lee, T. Inoue, M. Sakamoto, H. Muta, A. Wagner, G. Burr, Y. Kim, E. Gallagher, M. Hibbs, A. Tritchkov, Y. Granik, M. Fakhry, K. Adam, G. Berger, M. Lam, A. Dave, and N. Cobb, “Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations,” in Optical Microlithography XXIII, M. V. Dusa and W. Conley, eds., Proc. SPIE 7640, 764006 (2010).
- K. Lai, A. E. Rosenbluth, S. Bagheri, J. Hoffnagle, K. Tian, D. Melville, J. Tirapu-Azpiroz, M. Fakhry, Y. Kim, S. Halle, G. McIntyre, A. Wagner, G. Burr, M. Burkhardt, D. Corliss, E. Gallagher, T. Faure, M. Hibbs, D. Flagello, J. Zimmermann, B. Kneer, F. Rohmund, F. Hartung, C. Hennerkes, M. Manu, R. Kazinczi, A. Engelen, R. Carpaij, R. Groenendijk, J. Hageman, and C. Russ, “Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process,” in Optical Microlithography XXIV, H. J. Levinson and M. V. Dusa eds., Proc. SPIE 7274, 72740A (2009).
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- D. Melville, A. Rosenbluth, K. Tian, K. Lai, S. Bagheri, J. Tirapu-Azpiroz, J. Meiring, S. Halle, G. McIntyre, T. Faure, D. Corliss, A. Krasnoperova, L. Zhuang, P. Strenski, A. Waechter, L. Ladanyi, F. Barahona, D. Scarpazza, J. Lee, T. Inoue, M. Sakamoto, H. Muta, A. Wagner, G. Burr, Y. Kim, E. Gallagher, M. Hibbs, A. Tritchkov, Y. Granik, M. Fakhry, K. Adam, G. Berger, M. Lam, A. Dave, and N. Cobb, “Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations,” in Optical Microlithography XXIII, M. V. Dusa and W. Conley, eds., Proc. SPIE 7640, 764006 (2010).
- S. Sherif, B. Saleh, and R. De Leone, “Binary images synthesis using mixed linear integar programming,” IEEE Trans. Image Process.4, 1252–1257 (1995). [CrossRef] [PubMed]
- T. Dam, V. Tolani, P. Hu, K.-H. Baik, L. Pang, B. Gleason, S. D. Slonaker, and J. K. Tyminski, “Source-mask optimization (SMO): from theory to practice,” in Optical Microlithography XXIII, M. V. Dusa and W. Conley, eds., Proc. SPIE 7640, 764006 (2010).
- M. L. Kempsell, E. Hendrickx, A. Tritchkov, K. Sakajiri, K. Yasui, S. Yoshitake, Y. Granik, G. Vandenberghe, and B. W. Smith, “Inverse lithography for 45-nm-node contact holes at 1.35 numerical aperture,” J. Microlith. Microfab. Microsys.8, 043001 (2009). [CrossRef]
- S. Hsu, Z. Li, L. Chen, K. Gronlund, H.-Y. Liu, and R. Socha, “Source-mask co-optimization: optimize design for imaging and impact of source complexity on lithography performance,” in Lithography Asia 2009, A. C. Chen, W.-S. Han, B. J. Lin, and A. Yen eds., Proc. SPIE 7520, 75200D (2009).
- T. Mülders, V. Domnenko, B. Küchler, T. Klimpel, H.-J. Stock, A. A. Poonawala, K. N. Taravade, and W. A. Stanton, “Simultaneous source-mask optimization: a numerical combining method,” in Photomask Technology 2010, M. W. Montgomery and W. Maurer, eds., Proc. SPIE7823, 78233X (2010).
- T. Mülders, V. Domnenko, B. Küchler, T. Klimpel, H.-J. Stock, A. A. Poonawala, K. N. Taravade, and W. A. Stanton, “Simultaneous source-mask optimization: a numerical combining method,” in Photomask Technology 2010, M. W. Montgomery and W. Maurer, eds., Proc. SPIE7823, 78233X (2010).
- D. Melville, A. Rosenbluth, K. Tian, K. Lai, S. Bagheri, J. Tirapu-Azpiroz, J. Meiring, S. Halle, G. McIntyre, T. Faure, D. Corliss, A. Krasnoperova, L. Zhuang, P. Strenski, A. Waechter, L. Ladanyi, F. Barahona, D. Scarpazza, J. Lee, T. Inoue, M. Sakamoto, H. Muta, A. Wagner, G. Burr, Y. Kim, E. Gallagher, M. Hibbs, A. Tritchkov, Y. Granik, M. Fakhry, K. Adam, G. Berger, M. Lam, A. Dave, and N. Cobb, “Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations,” in Optical Microlithography XXIII, M. V. Dusa and W. Conley, eds., Proc. SPIE 7640, 764006 (2010).
- Y. Deng, Y. Zou, K. Yoshimoto, Y. Ma, C. E. Tabery, J. Kye, L. Capodieci, and H. J. Levinson, “Considerations in source-mask optimization for logic applications,” in Optical Microlithography XXIII, M. V. Dusa and W. Conley, eds., Proc. SPIE 7640, 76401J (2010).
- S. K. Choy, N. Jia, C. S. Tong, M. L. Tang, and E. Y. Lam, “A robust computational algorithm for inverse photomask synthesis in optical projection lithography,” SIAM J. Imaging Sciences5, 625–651 (2012). [CrossRef]
- T. Mülders, V. Domnenko, B. Küchler, T. Klimpel, H.-J. Stock, A. A. Poonawala, K. N. Taravade, and W. A. Stanton, “Simultaneous source-mask optimization: a numerical combining method,” in Photomask Technology 2010, M. W. Montgomery and W. Maurer, eds., Proc. SPIE7823, 78233X (2010).
- K. Lai, A. E. Rosenbluth, S. Bagheri, J. Hoffnagle, K. Tian, D. Melville, J. Tirapu-Azpiroz, M. Fakhry, Y. Kim, S. Halle, G. McIntyre, A. Wagner, G. Burr, M. Burkhardt, D. Corliss, E. Gallagher, T. Faure, M. Hibbs, D. Flagello, J. Zimmermann, B. Kneer, F. Rohmund, F. Hartung, C. Hennerkes, M. Manu, R. Kazinczi, A. Engelen, R. Carpaij, R. Groenendijk, J. Hageman, and C. Russ, “Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process,” in Optical Microlithography XXIV, H. J. Levinson and M. V. Dusa eds., Proc. SPIE 7274, 72740A (2009).
- D. Melville, A. Rosenbluth, K. Tian, K. Lai, S. Bagheri, J. Tirapu-Azpiroz, J. Meiring, S. Halle, G. McIntyre, T. Faure, D. Corliss, A. Krasnoperova, L. Zhuang, P. Strenski, A. Waechter, L. Ladanyi, F. Barahona, D. Scarpazza, J. Lee, T. Inoue, M. Sakamoto, H. Muta, A. Wagner, G. Burr, Y. Kim, E. Gallagher, M. Hibbs, A. Tritchkov, Y. Granik, M. Fakhry, K. Adam, G. Berger, M. Lam, A. Dave, and N. Cobb, “Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations,” in Optical Microlithography XXIII, M. V. Dusa and W. Conley, eds., Proc. SPIE 7640, 764006 (2010).
- D. Melville, A. Rosenbluth, K. Tian, K. Lai, S. Bagheri, J. Tirapu-Azpiroz, J. Meiring, S. Halle, G. McIntyre, T. Faure, D. Corliss, A. Krasnoperova, L. Zhuang, P. Strenski, A. Waechter, L. Ladanyi, F. Barahona, D. Scarpazza, J. Lee, T. Inoue, M. Sakamoto, H. Muta, A. Wagner, G. Burr, Y. Kim, E. Gallagher, M. Hibbs, A. Tritchkov, Y. Granik, M. Fakhry, K. Adam, G. Berger, M. Lam, A. Dave, and N. Cobb, “Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations,” in Optical Microlithography XXIII, M. V. Dusa and W. Conley, eds., Proc. SPIE 7640, 764006 (2010).
- K. Lai, A. E. Rosenbluth, S. Bagheri, J. Hoffnagle, K. Tian, D. Melville, J. Tirapu-Azpiroz, M. Fakhry, Y. Kim, S. Halle, G. McIntyre, A. Wagner, G. Burr, M. Burkhardt, D. Corliss, E. Gallagher, T. Faure, M. Hibbs, D. Flagello, J. Zimmermann, B. Kneer, F. Rohmund, F. Hartung, C. Hennerkes, M. Manu, R. Kazinczi, A. Engelen, R. Carpaij, R. Groenendijk, J. Hageman, and C. Russ, “Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process,” in Optical Microlithography XXIV, H. J. Levinson and M. V. Dusa eds., Proc. SPIE 7274, 72740A (2009).
- T. Dam, V. Tolani, P. Hu, K.-H. Baik, L. Pang, B. Gleason, S. D. Slonaker, and J. K. Tyminski, “Source-mask optimization (SMO): from theory to practice,” in Optical Microlithography XXIII, M. V. Dusa and W. Conley, eds., Proc. SPIE 7640, 764006 (2010).
- S. K. Choy, N. Jia, C. S. Tong, M. L. Tang, and E. Y. Lam, “A robust computational algorithm for inverse photomask synthesis in optical projection lithography,” SIAM J. Imaging Sciences5, 625–651 (2012). [CrossRef]
- M. L. Kempsell, E. Hendrickx, A. Tritchkov, K. Sakajiri, K. Yasui, S. Yoshitake, Y. Granik, G. Vandenberghe, and B. W. Smith, “Inverse lithography for 45-nm-node contact holes at 1.35 numerical aperture,” J. Microlith. Microfab. Microsys.8, 043001 (2009). [CrossRef]
- D. Melville, A. Rosenbluth, K. Tian, K. Lai, S. Bagheri, J. Tirapu-Azpiroz, J. Meiring, S. Halle, G. McIntyre, T. Faure, D. Corliss, A. Krasnoperova, L. Zhuang, P. Strenski, A. Waechter, L. Ladanyi, F. Barahona, D. Scarpazza, J. Lee, T. Inoue, M. Sakamoto, H. Muta, A. Wagner, G. Burr, Y. Kim, E. Gallagher, M. Hibbs, A. Tritchkov, Y. Granik, M. Fakhry, K. Adam, G. Berger, M. Lam, A. Dave, and N. Cobb, “Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations,” in Optical Microlithography XXIII, M. V. Dusa and W. Conley, eds., Proc. SPIE 7640, 764006 (2010).
- T. Dam, V. Tolani, P. Hu, K.-H. Baik, L. Pang, B. Gleason, S. D. Slonaker, and J. K. Tyminski, “Source-mask optimization (SMO): from theory to practice,” in Optical Microlithography XXIII, M. V. Dusa and W. Conley, eds., Proc. SPIE 7640, 764006 (2010).
- M. L. Kempsell, E. Hendrickx, A. Tritchkov, K. Sakajiri, K. Yasui, S. Yoshitake, Y. Granik, G. Vandenberghe, and B. W. Smith, “Inverse lithography for 45-nm-node contact holes at 1.35 numerical aperture,” J. Microlith. Microfab. Microsys.8, 043001 (2009). [CrossRef]
- D. Melville, A. Rosenbluth, K. Tian, K. Lai, S. Bagheri, J. Tirapu-Azpiroz, J. Meiring, S. Halle, G. McIntyre, T. Faure, D. Corliss, A. Krasnoperova, L. Zhuang, P. Strenski, A. Waechter, L. Ladanyi, F. Barahona, D. Scarpazza, J. Lee, T. Inoue, M. Sakamoto, H. Muta, A. Wagner, G. Burr, Y. Kim, E. Gallagher, M. Hibbs, A. Tritchkov, Y. Granik, M. Fakhry, K. Adam, G. Berger, M. Lam, A. Dave, and N. Cobb, “Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations,” in Optical Microlithography XXIII, M. V. Dusa and W. Conley, eds., Proc. SPIE 7640, 764006 (2010).
- D. Melville, A. Rosenbluth, K. Tian, K. Lai, S. Bagheri, J. Tirapu-Azpiroz, J. Meiring, S. Halle, G. McIntyre, T. Faure, D. Corliss, A. Krasnoperova, L. Zhuang, P. Strenski, A. Waechter, L. Ladanyi, F. Barahona, D. Scarpazza, J. Lee, T. Inoue, M. Sakamoto, H. Muta, A. Wagner, G. Burr, Y. Kim, E. Gallagher, M. Hibbs, A. Tritchkov, Y. Granik, M. Fakhry, K. Adam, G. Berger, M. Lam, A. Dave, and N. Cobb, “Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations,” in Optical Microlithography XXIII, M. V. Dusa and W. Conley, eds., Proc. SPIE 7640, 764006 (2010).
- K. Lai, A. E. Rosenbluth, S. Bagheri, J. Hoffnagle, K. Tian, D. Melville, J. Tirapu-Azpiroz, M. Fakhry, Y. Kim, S. Halle, G. McIntyre, A. Wagner, G. Burr, M. Burkhardt, D. Corliss, E. Gallagher, T. Faure, M. Hibbs, D. Flagello, J. Zimmermann, B. Kneer, F. Rohmund, F. Hartung, C. Hennerkes, M. Manu, R. Kazinczi, A. Engelen, R. Carpaij, R. Groenendijk, J. Hageman, and C. Russ, “Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process,” in Optical Microlithography XXIV, H. J. Levinson and M. V. Dusa eds., Proc. SPIE 7274, 72740A (2009).
- Y. Peng, J. Zhang, Y. Wang, and Z. Yu, “Gradient-based source and mask optimization in optical oithography,” IEEE Trans. Image Process.20, 2856–2864 (2011). [CrossRef] [PubMed]
- E. Y. Lam and A. K. Wong, “Computation lithography: virtual reality and virtual virtuality,” Opt. Express17, 12259–12268 (2009). [CrossRef] [PubMed]
- S. H. Chan, A. K. Wong, and E. Y. Lam, “Initialization for robust inverse synthesis of phase-shifting masks in optical projection lithography,” Opt. Express16, 14746–14760 (2008). [CrossRef] [PubMed]
- A. K. Wong, Resolution Enhancement Techniques in Optical Lithography, (SPIE, Washington, 2001). [CrossRef]
- A. K. Wong, Optical Imaging in Projection Microlithography, (SPIE, Washington, 2005). [CrossRef]
- J. Nocedal and S. J. Wright, Numerical Optimization, 2nd ed. (Springer, New York, 2006).
- M. L. Kempsell, E. Hendrickx, A. Tritchkov, K. Sakajiri, K. Yasui, S. Yoshitake, Y. Granik, G. Vandenberghe, and B. W. Smith, “Inverse lithography for 45-nm-node contact holes at 1.35 numerical aperture,” J. Microlith. Microfab. Microsys.8, 043001 (2009). [CrossRef]
- Y. Deng, Y. Zou, K. Yoshimoto, Y. Ma, C. E. Tabery, J. Kye, L. Capodieci, and H. J. Levinson, “Considerations in source-mask optimization for logic applications,” in Optical Microlithography XXIII, M. V. Dusa and W. Conley, eds., Proc. SPIE 7640, 76401J (2010).
- M. L. Kempsell, E. Hendrickx, A. Tritchkov, K. Sakajiri, K. Yasui, S. Yoshitake, Y. Granik, G. Vandenberghe, and B. W. Smith, “Inverse lithography for 45-nm-node contact holes at 1.35 numerical aperture,” J. Microlith. Microfab. Microsys.8, 043001 (2009). [CrossRef]
- J.-C. Yu, P. Yu, and H. Y. Chao, “Fast source optimization involving quadratic line-contour objectives for the resist image,” Opt. Express20, 8161–8174 (2012). [CrossRef] [PubMed]
- J.-C. Yu and P. Yu, “Gradient-based fast source mask optimization (SMO),” in Optical Microlithography XXIV, M. V. Dusa, ed., Proc. SPIE 7973, 797320 (2011).
- J.-C. Yu and P. Yu, “Choosing objective functions for inverse lithography patterning,” in Optical Microlithography XXIV, M. V. Dusa, ed., Proc. SPIE7973, 79731N (2011).
- J.-C. Yu, P. Yu, and H. Y. Chao, “Fast source optimization involving quadratic line-contour objectives for the resist image,” Opt. Express20, 8161–8174 (2012). [CrossRef] [PubMed]
- J.-C. Yu and P. Yu, “Gradient-based fast source mask optimization (SMO),” in Optical Microlithography XXIV, M. V. Dusa, ed., Proc. SPIE 7973, 797320 (2011).
- J.-C. Yu and P. Yu, “Choosing objective functions for inverse lithography patterning,” in Optical Microlithography XXIV, M. V. Dusa, ed., Proc. SPIE7973, 79731N (2011).
- Y. Peng, J. Zhang, Y. Wang, and Z. Yu, “Gradient-based source and mask optimization in optical oithography,” IEEE Trans. Image Process.20, 2856–2864 (2011). [CrossRef] [PubMed]
- Y. Peng, J. Zhang, Y. Wang, and Z. Yu, “Gradient-based source and mask optimization in optical oithography,” IEEE Trans. Image Process.20, 2856–2864 (2011). [CrossRef] [PubMed]
- T. H. Dam, X. Zhou, D. Chen, A. Adamov, D. Peng, and B. Gleason, “Validation and application of a mask model for inverse lithography,” in Design for Manufacturability through Design-Process Integration II, V. K. Sing and M. L. Rieger eds., Proc. SPIE 6925, 69251J (2008).
- D. Melville, A. Rosenbluth, K. Tian, K. Lai, S. Bagheri, J. Tirapu-Azpiroz, J. Meiring, S. Halle, G. McIntyre, T. Faure, D. Corliss, A. Krasnoperova, L. Zhuang, P. Strenski, A. Waechter, L. Ladanyi, F. Barahona, D. Scarpazza, J. Lee, T. Inoue, M. Sakamoto, H. Muta, A. Wagner, G. Burr, Y. Kim, E. Gallagher, M. Hibbs, A. Tritchkov, Y. Granik, M. Fakhry, K. Adam, G. Berger, M. Lam, A. Dave, and N. Cobb, “Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations,” in Optical Microlithography XXIII, M. V. Dusa and W. Conley, eds., Proc. SPIE 7640, 764006 (2010).
- K. Lai, A. E. Rosenbluth, S. Bagheri, J. Hoffnagle, K. Tian, D. Melville, J. Tirapu-Azpiroz, M. Fakhry, Y. Kim, S. Halle, G. McIntyre, A. Wagner, G. Burr, M. Burkhardt, D. Corliss, E. Gallagher, T. Faure, M. Hibbs, D. Flagello, J. Zimmermann, B. Kneer, F. Rohmund, F. Hartung, C. Hennerkes, M. Manu, R. Kazinczi, A. Engelen, R. Carpaij, R. Groenendijk, J. Hageman, and C. Russ, “Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process,” in Optical Microlithography XXIV, H. J. Levinson and M. V. Dusa eds., Proc. SPIE 7274, 72740A (2009).
- Y. Deng, Y. Zou, K. Yoshimoto, Y. Ma, C. E. Tabery, J. Kye, L. Capodieci, and H. J. Levinson, “Considerations in source-mask optimization for logic applications,” in Optical Microlithography XXIII, M. V. Dusa and W. Conley, eds., Proc. SPIE 7640, 76401J (2010).
- H. Hu, Y. Zou, and Y. Deng, “Optimization on illumination source with design of experiments,” in Optical Microlithography XXIII, M. V. Dusa and W. Conley, eds., Proc. SPIE7640, 764027 (2010).
IEEE Trans. Image Process.
- S. Sherif, B. Saleh, and R. De Leone, “Binary images synthesis using mixed linear integar programming,” IEEE Trans. Image Process.4, 1252–1257 (1995). [CrossRef] [PubMed]
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J. Microlith. Microfab. Microsys.
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J. Opt.
- N. Jia and E. Y. Lam, “Machine learning for inverse lithography: using stochastic gradient descent for robust photomask synthesis,” J. Opt.12, 045601 (2010). [CrossRef]
Opt. Express
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- X. Ma and G. R. Arce, “Pixel-based simultaneous source and mask optimization for resolution enhancement in optical lithography,” Opt. Express17, 5783–5793 (2009). [CrossRef] [PubMed]
- J.-C. Yu, P. Yu, and H. Y. Chao, “Fast source optimization involving quadratic line-contour objectives for the resist image,” Opt. Express20, 8161–8174 (2012). [CrossRef] [PubMed]
- E. Y. Lam and A. K. Wong, “Computation lithography: virtual reality and virtual virtuality,” Opt. Express17, 12259–12268 (2009). [CrossRef] [PubMed]
SIAM J. Imaging Sciences
- S. K. Choy, N. Jia, C. S. Tong, M. L. Tang, and E. Y. Lam, “A robust computational algorithm for inverse photomask synthesis in optical projection lithography,” SIAM J. Imaging Sciences5, 625–651 (2012). [CrossRef]
Other
- A. K. Wong, Optical Imaging in Projection Microlithography, (SPIE, Washington, 2005). [CrossRef]
- J.-C. Yu and P. Yu, “Gradient-based fast source mask optimization (SMO),” in Optical Microlithography XXIV, M. V. Dusa, ed., Proc. SPIE 7973, 797320 (2011).
- A. K. Wong, Resolution Enhancement Techniques in Optical Lithography, (SPIE, Washington, 2001). [CrossRef]
- T. H. Dam, X. Zhou, D. Chen, A. Adamov, D. Peng, and B. Gleason, “Validation and application of a mask model for inverse lithography,” in Design for Manufacturability through Design-Process Integration II, V. K. Sing and M. L. Rieger eds., Proc. SPIE 6925, 69251J (2008).
- Y. Deng, Y. Zou, K. Yoshimoto, Y. Ma, C. E. Tabery, J. Kye, L. Capodieci, and H. J. Levinson, “Considerations in source-mask optimization for logic applications,” in Optical Microlithography XXIII, M. V. Dusa and W. Conley, eds., Proc. SPIE 7640, 76401J (2010).
- D. Melville, A. Rosenbluth, K. Tian, K. Lai, S. Bagheri, J. Tirapu-Azpiroz, J. Meiring, S. Halle, G. McIntyre, T. Faure, D. Corliss, A. Krasnoperova, L. Zhuang, P. Strenski, A. Waechter, L. Ladanyi, F. Barahona, D. Scarpazza, J. Lee, T. Inoue, M. Sakamoto, H. Muta, A. Wagner, G. Burr, Y. Kim, E. Gallagher, M. Hibbs, A. Tritchkov, Y. Granik, M. Fakhry, K. Adam, G. Berger, M. Lam, A. Dave, and N. Cobb, “Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations,” in Optical Microlithography XXIII, M. V. Dusa and W. Conley, eds., Proc. SPIE 7640, 764006 (2010).
- K. Iwase, P. D. Bisschop, B. Laenens, Z. Li, K. Gronlund, P. V. Adrichem, and S. Hsu, “A new source optimization approach for 2X node logic,” in Photomask Technology 2011, W. Maurer and F. E. Abboud, eds., Proc. SPIE8166, 81662A (2011).
- H. Hu, Y. Zou, and Y. Deng, “Optimization on illumination source with design of experiments,” in Optical Microlithography XXIII, M. V. Dusa and W. Conley, eds., Proc. SPIE7640, 764027 (2010).
- T. Mülders, V. Domnenko, B. Küchler, T. Klimpel, H.-J. Stock, A. A. Poonawala, K. N. Taravade, and W. A. Stanton, “Simultaneous source-mask optimization: a numerical combining method,” in Photomask Technology 2010, M. W. Montgomery and W. Maurer, eds., Proc. SPIE7823, 78233X (2010).
- M. Fakhry, Y. Granik, K. Adam, and K. Lai, “Total source mask optimization: high-capacity, resist modeling, and production-ready mask solution,” in Photomask Technology 2011, W. Maurer and F. E. Abboud, eds., Proc. SPIE8166, 81663M (2011).
- T. Dam, V. Tolani, P. Hu, K.-H. Baik, L. Pang, B. Gleason, S. D. Slonaker, and J. K. Tyminski, “Source-mask optimization (SMO): from theory to practice,” in Optical Microlithography XXIII, M. V. Dusa and W. Conley, eds., Proc. SPIE 7640, 764006 (2010).
- Y. Deng, T. H. Coskun, J. Kye, and H. J. Levinson, “Lithography target optimization with source-mask optimization,” in Optical Microlithography XXV, W. Conley, ed., Proc. SPIE 8326, 83262P (2012).
- T. H. Coskun, H. Dai, V. Kamat, C.-M. Hsu, G. Santoro, C. Ngai, M. Reybrouck, G. Grozev, and H.-T. Huang, “Free form source and mask optimization for negative tone resist development for 22nm node contact holes,” in Optical Microlithography XXV, W. Conley, ed., Proc. SPIE 8326, 83260V (2012).
- J. Kim and M. Fan, “Hotspot detection on post-OPC layout using full chip simulation based verification tool : a case study with aerial image simulation,” in 23rd Annual BACUS Symposium on Photomask Technology, K. R. Kimmel and W. Staud, eds., Proc. SPIE 5256, 919–925 (2003).
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