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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 20, Iss. 19 — Sep. 10, 2012
  • pp: 21792–21804

Hotspot-aware fast source and mask optimization

Jia Li, Yijiang Shen, and Edmund Y. Lam  »View Author Affiliations


Optics Express, Vol. 20, Issue 19, pp. 21792-21804 (2012)
http://dx.doi.org/10.1364/OE.20.021792


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Abstract

Source mask optimization (SMO) is a useful technique for printing the integrated circuit (IC) on a wafer with increasingly smaller feature size. However, complex SMO algorithms generally lead to undesirably long runtime resulting from an optimization of largely identical regions over the whole mask pattern. In this work, a weighted SMO scheme incorporating both an awareness of the hotspots and robustness against process variations is proposed. We show how optimal solutions are reached with fewer iterations by applying various degrees of correction in the corresponding regions. The proposed method includes identifying the hotspots and combining a weight matrix to the cost function for adjustment and control. Simulation results are compared with the mask optimization (under a fixed source) and conventional SMO to illustrate the performance improvement in terms of pattern fidelity, convergence rate and process window size.

© 2012 OSA

OCIS Codes
(110.3960) Imaging systems : Microlithography
(110.5220) Imaging systems : Photolithography
(110.1758) Imaging systems : Computational imaging

ToC Category:
Imaging Systems

History
Original Manuscript: July 17, 2012
Revised Manuscript: September 2, 2012
Manuscript Accepted: September 3, 2012
Published: September 7, 2012

Citation
Jia Li, Yijiang Shen, and Edmund Y. Lam, "Hotspot-aware fast source and mask optimization," Opt. Express 20, 21792-21804 (2012)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-20-19-21792


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