OSA's Digital Library

Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 20, Iss. 2 — Jan. 16, 2012
  • pp: 854–863

Characterization of 1064nm nanosecond laser-induced damage on antireflection coatings grown by atomic layer deposition

Zhichao Liu, Songlin Chen, Ping Ma, Yaowei Wei, Yi Zheng, Feng Pan, Hao Liu, and Gengyu Tang  »View Author Affiliations


Optics Express, Vol. 20, Issue 2, pp. 854-863 (2012)
http://dx.doi.org/10.1364/OE.20.000854


View Full Text Article

Enhanced HTML    Acrobat PDF (3324 KB)





Browse Journals / Lookup Meetings

Browse by Journal and Year


   


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools

Share
Citations

Abstract

Damage tests are carried out at 1064nm to measure the laser resistance of TiO2/Al2O3and HfO2/Al2O3 antireflection coatings grown by atomic layer deposition (ALD). The damage results are determined by S-on-1 and R-on-1 tests. Interestingly, the damage performance of ALD coatings is similar to those grown by conventional e-beam evaporation process. A decline law of damage resistance under multiple irradiations is revealed. The influence of growth temperature on damage performance has been investigated. Result shows that the crystallization of TiO2 layer at higher temperature could lead to numerous absorption defects that reduce the laser-induced damage threshold (LIDT). In addition, it has been found that using inorganic compound instead of organic compound as precursors for ALD process maybe effectively prevent carbon impurities in films and will increase the LIDT obviously.

© 2012 OSA

OCIS Codes
(140.3330) Lasers and laser optics : Laser damage
(310.1210) Thin films : Antireflection coatings

ToC Category:
Thin Films

History
Original Manuscript: November 22, 2011
Revised Manuscript: December 19, 2011
Manuscript Accepted: December 19, 2011
Published: January 3, 2012

Citation
Zhichao Liu, Songlin Chen, Ping Ma, Yaowei Wei, Yi Zheng, Feng Pan, Hao Liu, and Gengyu Tang, "Characterization of 1064nm nanosecond laser-induced damage on antireflection coatings grown by atomic layer deposition," Opt. Express 20, 854-863 (2012)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-20-2-854


Sort:  Author  |  Year  |  Journal  |  Reset  

References

  1. E. I. Moses, J. H. Campbell, C. J. Stolz, and C. R. Wuest, “The national ignition facility: the world’s largest optics and laser system,” Proc. SPIE5001, 1–15 (2003). [CrossRef]
  2. M. Ritala and M. Leskelä, “Atomic layer epitaxy—a valuable tool for nanotechnology?” Nanotechnology10(1), 19–24 (1999). [CrossRef]
  3. J. Maula, “Atomic layer deposition (ALD) for optical nanofabrication,” Proc. SPIE7591, 75910S, 75910S-15 (2010). [CrossRef]
  4. O. Sneh, R. B. Clark-Phelps, A. R. Londergan, J. Winkler, and T. E. Seidel, “Thin film atomic layer deposition equipment for semiconductor processing,” Thin Solid Films402(1-2), 248–261 (2002). [CrossRef]
  5. S. Zaitsu, S. Motokoshi, T. Jitsuno, M. Nakatsuka, and T. Yamanaka, “Large-area optical coatings with uniform thickness grown by surface chemical reactions for high-power laser applications,” Jpn. J. Appl. Phys.41(Part 1, No. 1), 160–165 (2002). [CrossRef]
  6. P. Kumar, M. K. Wiedmann, C. H. Winter, and I. Avrutsky, “Optical properties of Al2O3 thin films grown by atomic layer deposition,” Appl. Opt.48(28), 5407–5412 (2009). [CrossRef] [PubMed]
  7. A. Szeghalmi, M. Helgert, R. Brunner, F. Heyroth, U. Gösele, and M. Knez, “Atomic layer deposition of Al2O3 and TiO2 multilayers for applications as bandpass filters and antireflection coatings,” Appl. Opt.48(9), 1727–1732 (2009). [CrossRef] [PubMed]
  8. S. S. Kim, N. T. Gabriel, W. B. Song, and J. J. Talghader, “Encapsulation of low-reflective-index SiO2 nanorods by Al2O3 with atomic layer deposition,” Opt. Express15(24), 16285–16291 (2007). [CrossRef] [PubMed]
  9. T. Pilvi, M. Ritala, M. Leskelä, M. Bischoff, U. Kaiser, and N. Kaiser, “Atomic layer deposition process with TiF4 as a precursor for depositing metal fluoride thin films,” Appl. Opt.47(13), C271–C274 (2008). [CrossRef] [PubMed]
  10. N. B. Abaffy, P. Evans, G. Triani, and D. McCulloch, “Multilayer alumina and titania optical coatings prepared by atomic layer deposition,” Proc. SPIE7041, 70419 (2008).
  11. Y. W. Wei, H. Liu, O. Y. Sheng, Z. C. Liu, S. L. Chen, and L. L. Yang, “Laser damage properties of TiO2/Al2O3 thin films grown by atomic layer deposition,” Appl. Opt.50(24), 4720–4727 (2011). [CrossRef] [PubMed]
  12. S. Zaitsu, S. Motokoshi, T. Jitsuno, M. Nakatsuka, and T. Yamanaka, “Laser damage properties of optical coatings with nanoscale layers grown by atomic layer deposition,” Jpn. J. Appl. Phys.43(3), 1034–1035 (2004). [CrossRef]
  13. M. Mero, J. Liu, W. Rudolph, D. Ristau, and K. Starke, “Scaling laws of femtosecond laser pulse induced breakdown in oxide films,” Phys. Rev. B71(11), 115109 (2005). [CrossRef]
  14. H. F. Jiao, T. Ding, and Q. Zhang, “Comparative study of Laser induce damage of HfO2/SiO2 and TiO2/SiO2 mirrors at 1064 nm,” Opt. Express19(5), 4059–4066 (2011). [CrossRef] [PubMed]
  15. J. DiJon, T. Poiroux, and C. Desrumaux, “Nano absorbing centers: a key point in laser damage thin films,” Proc. SPIE2966, 315–325 (1997). [CrossRef]
  16. S. Papernov and A. W. Schmid, “Laser-induced surface damage of optical materials: Absorption sources, initiation, growth, and mitigation,” Proc. SPIE7132, 71321J (2008).
  17. A. Ciapponi, P. Allenspacher, W. Riede, J. Herringer, and J. Arenberg, “S on 1 testing of AR and HR designs at 1064nm,” Proc. SPIE7842, 78420J, 78420J-6 (2010). [CrossRef]
  18. L. Gallais, J. Y. Natoli, and C. Amra, “Statistical study of single and multiple pulse laser-induced damage in glasses,” Opt. Express10(25), 1465–1474 (2002). [PubMed]
  19. A. Melninkaitis, D. Miksys, R. Grigonis, V. Sirutkaitis, D. Tumosa, G. Skokov, and D. Kuzma, “Multiple pulse laser-induced damage of antireflection coated lithium triborate,” Proc. SPIE5963, 59631I, 59631I-8 (2005). [CrossRef]
  20. M. Mero, L. A. Emmert, and W. Rudolph, “The role of native and photoinduced defects in the multi-pulse subpicosecond damage behavior of oxide films,” Proc. SPIE7132, 713209, 713209-10 (2008). [CrossRef]
  21. J. W. Arenberg, “Life testing for laser optics: a first look,” Proc. SPIE7504, 7504I (2009).
  22. J. W. Arenberg, W. Riede, A. Ciapponi, P. Allenspacher, and J. Herringer, “An empirical investigation of the laser survivability curve,” Proc. SPIE7842, 78421B, 78421B-8 (2010). [CrossRef]

Cited By

Alert me when this paper is cited

OSA is able to provide readers links to articles that cite this paper by participating in CrossRef's Cited-By Linking service. CrossRef includes content from more than 3000 publishers and societies. In addition to listing OSA journal articles that cite this paper, citing articles from other participating publishers will also be listed.


« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited