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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 20, Iss. 2 — Jan. 16, 2012
  • pp: 941–948

Enhanced 355-nm generation using a simple method to compensate for walk-off loss

C. Jung, W. Shin, B.-A. Yu, Y. L. Lee, and Y.-C. Noh  »View Author Affiliations


Optics Express, Vol. 20, Issue 2, pp. 941-948 (2012)
http://dx.doi.org/10.1364/OE.20.000941


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Abstract

We theoretically and experimentally investigated a novel walk-off-compensation method for efficient ultraviolet beam generation. Through theoretical investigation, we described in detail how the power of a generated UV beam can be enhanced by the method; thus, we obtained a brief expression for the output power which has a prediction error of about 30%. In addition, we found that the beam quality can also be enhanced using this method. Through experiments using an alpha barium borate crystal as a walk-off compensator, we found that the power of the generated ultraviolet beam increased 1.9 times.

© 2011 OSA

OCIS Codes
(190.2620) Nonlinear optics : Harmonic generation and mixing
(140.3515) Lasers and laser optics : Lasers, frequency doubled

ToC Category:
Lasers and Laser Optics

History
Original Manuscript: October 26, 2011
Revised Manuscript: December 14, 2011
Manuscript Accepted: December 14, 2011
Published: January 4, 2011

Citation
C. Jung, W. Shin, B.-A. Yu, Y. L. Lee, and Y.-C. Noh, "Enhanced 355-nm generation using a simple method to compensate for walk-off loss," Opt. Express 20, 941-948 (2012)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-20-2-941


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References

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