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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 20, Iss. 20 — Sep. 24, 2012
  • pp: 22490–22502

Structural factors impacting carrier transport and electroluminescence from Si nanocluster-sensitized Er ions

Sébastien Cueff, Christophe Labbé, Olivier Jambois, Yonder Berencén, Anthony J. Kenyon, Blas Garrido, and Richard Rizk  »View Author Affiliations


Optics Express, Vol. 20, Issue 20, pp. 22490-22502 (2012)
http://dx.doi.org/10.1364/OE.20.022490


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Abstract

We present an analysis of factors influencing carrier transport and electroluminescence (EL) at 1.5 µm from erbium-doped silicon-rich silica (SiOx) layers. The effects of both the active layer thickness and the Si-excess content on the electrical excitation of erbium are studied. We demonstrate that when the thickness is decreased from a few hundred to tens of nanometers the conductivity is greatly enhanced. Carrier transport is well described in all cases by a Poole-Frenkel mechanism, while the thickness-dependent current density suggests an evolution of both density and distribution of trapping states induced by Si nanoinclusions. We ascribe this observation to stress-induced effects prevailing in thin films, which inhibit the agglomeration of Si atoms, resulting in a high density of sub-nm Si inclusions that induce traps much shallower than those generated by Si nanoclusters (Si-ncs) formed in thicker films. There is no direct correlation between high conductivity and optimized EL intensity at 1.5 µm. Our results suggest that the main excitation mechanism governing the EL signal is impact excitation, which gradually becomes more efficient as film thickness increases, thanks to the increased segregation of Si-ncs, which in turn allows more efficient injection of hot electrons into the oxide matrix. Optimization of the EL signal is thus found to be a compromise between conductivity and both number and degree of segregation of Si-ncs, all of which are governed by a combination of excess Si content and sample thickness. This material study has strong implications for many electrically-driven devices using Si-ncs or Si-excess mediated EL.

© 2012 OSA

OCIS Codes
(130.0250) Integrated optics : Optoelectronics
(160.5690) Materials : Rare-earth-doped materials
(230.3670) Optical devices : Light-emitting diodes
(220.4241) Optical design and fabrication : Nanostructure fabrication

ToC Category:
Integrated Optics

History
Original Manuscript: April 27, 2012
Revised Manuscript: July 6, 2012
Manuscript Accepted: July 12, 2012
Published: September 17, 2012

Citation
Sébastien Cueff, Christophe Labbé, Olivier Jambois, Yonder Berencén, Anthony J. Kenyon, Blas Garrido, and Richard Rizk, "Structural factors impacting carrier transport and electroluminescence from Si nanocluster-sensitized Er ions," Opt. Express 20, 22490-22502 (2012)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-20-20-22490


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