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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 20, Iss. 21 — Oct. 8, 2012
  • pp: 23180–23185

Non-ablative texturing of silicon surface with a continuous wave fiber laser

H. Farrokhi, Wei Zhou, H. Y. Zheng, and Z. L. Li  »View Author Affiliations

Optics Express, Vol. 20, Issue 21, pp. 23180-23185 (2012)

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Laser surface texturing based on ablation has been widely used, but hardly any reports can be found on non-ablative laser surface texturing. Silicon is highly transparent to the infrared wavelength of fiber laser (λ = 1090 nm) and thus regarded as an unsuitable tool for the purpose of surface texturing. However, we succeeded in using a continuous wave fiber laser to produce regular arrays of sub-micron bumps on silicon surface. The approach is shown to be based on laser-induced oxidation of silicon.

© 2012 OSA

OCIS Codes
(140.3390) Lasers and laser optics : Laser materials processing
(220.4000) Optical design and fabrication : Microstructure fabrication
(220.4241) Optical design and fabrication : Nanostructure fabrication

ToC Category:
Laser Microfabrication

Original Manuscript: August 15, 2012
Revised Manuscript: September 20, 2012
Manuscript Accepted: September 20, 2012
Published: September 25, 2012

H. Farrokhi, Wei Zhou, H. Y. Zheng, and Z. L. Li, "Non-ablative texturing of silicon surface with a continuous wave fiber laser," Opt. Express 20, 23180-23185 (2012)

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  1. T.-H. Her, R. J. Finlay, C. Wu, S. Deliwala, and E. Mazur, “Microstructuring of silicon with femtosecond laser pulses,” Appl. Phys. Lett.73(12), 1673–1675 (1998). [CrossRef]
  2. V. Zorba, I. Alexandrou, I. Zergioti, A. Manousaki, C. Ducati, A. Neumeister, C. Fotakis, and G. A. J. Amaratunga, “Laser microstructuring of Si surfaces for low-threshold field-electron emission,” Thin Solid Films453–454, 492–495 (2004). [CrossRef]
  3. V. Zorba, P. Tzanetakis, C. Fotakis, E. Spanakis, E. Stratakis, D. G. Papazoglou, and I. Zergioti, “Silicon electron emitters fabricated by ultraviolet laser pulses,” Appl. Phys. Lett.88(8), 081103 (2006). [CrossRef]
  4. P. Simon and J. Ihlemann, “Ablation of submicron structures on metals and semiconductors by femtosecond UV-laser pulses,” Appl. Surf. Sci.109–110, 25–29 (1997). [CrossRef]
  5. B. Borchers, J. Bekesi, P. Simon, and J. Ihlemann, “Submicron surface patterning by laser ablation with short UV pulses using a proximity phase mask setup,” J. Appl. Phys.107(6), 063106 (2010). [CrossRef]
  6. J. C. Zolper, S. Narayanan, S. R. Wenham, and M. A. Green, “16.7% efficient, laser textured, buried contact polycrystalline silicon solar cell,” Appl. Phys. Lett.55(22), 2363–2365 (1989). [CrossRef]
  7. M. Abbott and J. Cotter, “Optical and electrical properties of laser texturing for high-efficiency solar cells,” Prog. Photovolt. Res. Appl.14(3), 225–235 (2006). [CrossRef]
  8. B. K. Nayak, M. C. Gupta, and K. W. Kolasinski,“Spontaneous formation of nanospiked microstructures in germanium by femtosecond laser irradiation,” Nanotechnology18(19), 195302 (2007). [CrossRef]
  9. B. K. Nayak, M. C. Gupta, and K. W. Kolasinski, “Formation of nano-textured conical microstructures in titanium metal surface by femtosecond laser irradiation,” Appl. Phys. A-Mater.90, 399–402 (2008).
  10. Z. L. Li, T. Liu, C. C. Khin, A. C. Tan, L. E. Khoong, H. Y. Zheng, and W. Zhou, “Direct patterning in sub-surface of stainless steel using laser pulses,” Opt. Express18(15), 15990–15997 (2010). [CrossRef] [PubMed]
  11. B. K. Nayak and M. C. Gupta, “Femtosecond-laser-induced-crystallization and simultaneous formation of light trapping microstructures in thin a-Si:H films,” Appl. Phys. A-Mater.89, 663–666 (2007).
  12. H. Y. Zheng, H. X. Qian, and W. Zhou, “Analyses of surface coloration on TiO2 film irradiated with excimer laser,” Appl. Surf. Sci.254(7), 2174–2178 (2008). [CrossRef]
  13. X. C. Wang, H. Y. Zheng, C. W. Tan, F. Wang, H. Y. Yu, and K. L. Pey, “Fabrication of silicon nanobump arrays by near-field enhanced laser irradiation,” Appl. Phys. Lett.96(8), 084101–084103 (2010). [CrossRef]
  14. G. Wysocki, R. Denk, K. Piglmayer, N. Arnold, and D. Bauerle, “Single-step fabrication of silicon-cone arrays,” Appl. Phys. Lett.82(5), 692–693 (2003). [CrossRef]
  15. A. Soni, V. M. Sundaram, and S.-B. Wen, “The generation of nano-patterns on a pure silicon wafer in air and argon with sub-diffraction limit nanosecond laser pulses,” J. Phys. D Appl. Phys.43(14), 145301 (2010). [CrossRef]
  16. S.-B. Wen, R. Greif, and R. E. Russo, “Background gas effects on the generation of nanopatterns on a pure silicon wafer with multiple femtosecond near field laser ablation,” Appl. Phys. Lett.91(25), 251113 (2007). [CrossRef]
  17. D. Bäuerle, Laser Processing and Chemistry (Springer, 2000).

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