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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 20, Iss. 21 — Oct. 8, 2012
  • pp: 23180–23185

Non-ablative texturing of silicon surface with a continuous wave fiber laser

H. Farrokhi, Wei Zhou, H. Y. Zheng, and Z. L. Li  »View Author Affiliations


Optics Express, Vol. 20, Issue 21, pp. 23180-23185 (2012)
http://dx.doi.org/10.1364/OE.20.023180


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Abstract

Laser surface texturing based on ablation has been widely used, but hardly any reports can be found on non-ablative laser surface texturing. Silicon is highly transparent to the infrared wavelength of fiber laser (λ = 1090 nm) and thus regarded as an unsuitable tool for the purpose of surface texturing. However, we succeeded in using a continuous wave fiber laser to produce regular arrays of sub-micron bumps on silicon surface. The approach is shown to be based on laser-induced oxidation of silicon.

© 2012 OSA

OCIS Codes
(140.3390) Lasers and laser optics : Laser materials processing
(220.4000) Optical design and fabrication : Microstructure fabrication
(220.4241) Optical design and fabrication : Nanostructure fabrication

ToC Category:
Laser Microfabrication

History
Original Manuscript: August 15, 2012
Revised Manuscript: September 20, 2012
Manuscript Accepted: September 20, 2012
Published: September 25, 2012

Citation
H. Farrokhi, Wei Zhou, H. Y. Zheng, and Z. L. Li, "Non-ablative texturing of silicon surface with a continuous wave fiber laser," Opt. Express 20, 23180-23185 (2012)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-20-21-23180


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