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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 20, Iss. 21 — Oct. 8, 2012
  • pp: 23643–23652

Pattern-Integrated Interference Lithography: Prospects for Nano- and Microelectronics

Matthieu C. R. Leibovici, Guy M. Burrow, and Thomas K. Gaylord  »View Author Affiliations


Optics Express, Vol. 20, Issue 21, pp. 23643-23652 (2012)
http://dx.doi.org/10.1364/OE.20.023643


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Abstract

In recent years, limitations in optical lithography have challenged the cost-effective manufacture of nano- and microelectronic chips. Spatially regular designs have been introduced to improve manufacturability. However, regular designed layouts typically require an interference step followed by a trim step. These multiple steps increase cost and reduce yield. In the present work, Pattern-Integrated Interference Lithography (PIIL) is introduced to address this problem. PIIL is the integration of interference lithography and superposed pattern mask imaging, combining the interference and the trim into a single-exposure step. Example PIIL implementations and experimental demonstrations are presented. The degrees of freedom associated with the source, pattern mask, and Fourier filter designs are described.

© 2012 OSA

OCIS Codes
(070.6110) Fourier optics and signal processing : Spatial filtering
(090.1970) Holography : Diffractive optics
(120.4820) Instrumentation, measurement, and metrology : Optical systems
(260.3160) Physical optics : Interference
(070.2615) Fourier optics and signal processing : Frequency filtering
(110.4235) Imaging systems : Nanolithography

ToC Category:
Imaging Systems

History
Original Manuscript: June 18, 2012
Manuscript Accepted: September 20, 2012
Published: October 1, 2012

Citation
Matthieu C. R. Leibovici, Guy M. Burrow, and Thomas K. Gaylord, "Pattern-Integrated Interference Lithography: Prospects for Nano- and Microelectronics," Opt. Express 20, 23643-23652 (2012)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-20-21-23643


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