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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 20, Iss. 22 — Oct. 22, 2012
  • pp: 25030–25040

Effect of refractive index mismatch on multi-photon direct laser writing

Henry E. Williams, Zhenyue Luo, and Stephen M. Kuebler  »View Author Affiliations


Optics Express, Vol. 20, Issue 22, pp. 25030-25040 (2012)
http://dx.doi.org/10.1364/OE.20.025030


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Abstract

This work reports how the process of three-dimensional multi-photon direct laser writing (mpDLW) is affected when there is a small mismatch in refractive index between the material being patterned and the medium in which the focusing objective is immersed. Suspended-line microstructures were fabricated by mpDLW in the cross-linkable epoxide SU-8 as a function of focus depth and average incident power. It is found that even a small refractive index contrast of Δn = + 0.08 causes significant variation in feature width and height throughout the depth of the material. In particular, both the width and height of features can either increase or decrease with depth, depending upon how much the average incident laser power exceeds the threshold for writing. Vectorial diffraction theory is used to obtain insight into the origin of the effect and how to compensate for it. We demonstrate that varying the average focused power is a practical means for controlling the variation in feature size with focal depth.

© 2012 OSA

OCIS Codes
(220.4000) Optical design and fabrication : Microstructure fabrication
(350.3390) Other areas of optics : Laser materials processing

ToC Category:
Laser Microfabrication

History
Original Manuscript: August 28, 2012
Revised Manuscript: October 12, 2012
Manuscript Accepted: October 12, 2012
Published: October 17, 2012

Citation
Henry E. Williams, Zhenyue Luo, and Stephen M. Kuebler, "Effect of refractive index mismatch on multi-photon direct laser writing," Opt. Express 20, 25030-25040 (2012)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-20-22-25030


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