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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 20, Iss. 3 — Jan. 30, 2012
  • pp: 2942–2955

Study of moiré grating fabrication on metal samples using nanoimprint lithography

Minjin Tang, Huimin Xie, Jianguo Zhu, Xiaojun Li, and Yanjie Li  »View Author Affiliations


Optics Express, Vol. 20, Issue 3, pp. 2942-2955 (2012)
http://dx.doi.org/10.1364/OE.20.002942


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Abstract

A moiré grating is a basic optical component used in various moiré methods for deformation measurement. In this study, nanoimprint lithography (NIL) was proposed to produce high frequency moiré gratings on metal samples. A new type of NIL mold and a hot embossing system were developed to overcome the poor flatness and roughness of metal samples. This three-layer mold based on nickel grating was unbreakable, and the self-developed hot embossing system used a bellows cylinder to satisfy the parallelism requirement of grating fabrication on metal samples. In order to generate high quality moiré patterns, the grating profile of the mold was optimized. Then, 1200-3000 lines/mm frequency gratings were successfully fabricated on the different materials such as SiO2, aluminum and stainless steel. In order to evaluate the quality of the replication, the distortion in the fabricated SiO2 grating was analyzed by an inverse moiré method. As an application, the replicated grating on the aluminum sample in combination with the moiré interferometry was used to measure the tensile deformation of the sample. The successful experimental results demonstrate the feasibility and reliability of nanoimprint lithography to produce gratings on metal samples.

© 2012 OSA

OCIS Codes
(050.2770) Diffraction and gratings : Gratings
(120.4120) Instrumentation, measurement, and metrology : Moire' techniques
(220.3740) Optical design and fabrication : Lithography
(220.4241) Optical design and fabrication : Nanostructure fabrication

ToC Category:
Instrumentation, Measurement, and Metrology

History
Original Manuscript: October 17, 2011
Revised Manuscript: December 13, 2011
Manuscript Accepted: December 23, 2011
Published: January 24, 2012

Citation
Minjin Tang, Huimin Xie, Jianguo Zhu, Xiaojun Li, and Yanjie Li, "Study of moiré grating fabrication on metal samples using nanoimprint lithography," Opt. Express 20, 2942-2955 (2012)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-20-3-2942


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References

  1. R. Weller and B. M. Shepherd, “Displacement measurement by mechanical interferometry,” Proc. Soc. Exp. Stress Anal.6(1), 35–38 (1948).
  2. D. Post, B. Han, and P. Ifju, High Sensitivity Moiré: Experimental Analysis for Mechanics and Materials (Springer-Verlag, New York, 1994), Chap.4.
  3. A. Assa, J. Politch, and A. A. Betser, “Slope and curvature measurement by a double-frequency-grating shearing interferometer,” Exp. Mech.19(4), 129–137 (1979). [CrossRef]
  4. S. Kishimoto, M. Egashira, and N. Shinya, “Observation of micro-deformation by moiré method using a scanning electron microscope,” J. Soc. Mat. Sci.40(452), 637–641 (1991). [CrossRef]
  5. B. Pan, H. M. Xie, S. Kishimoto, and Y. Xing, “Experimental study of moiré method in laser scanning confocal microscopy,” Rev. Sci. Instrum.77(4), 043101 (2006). [CrossRef]
  6. H. Chen, D. Liu, and A. Lee, “Moiré in atomic force microscope,” Exp. Mech.24(1), 31–32 (2000).
  7. E. H. Anderson, C. M. Horwitz, and H. I. Smith, “Holographic lithography with thick photoresist,” Appl. Phys. Lett.43(9), 874–875 (1983). [CrossRef]
  8. S. Kishimoto, M. Egashira, and N. Shinya, “Microcreep deformation measurements by a moiré method using electron beam lithography and electron beam scan,” Opt. Eng.32(3), 522–526 (1993). [CrossRef]
  9. D. Yan, J. Cheng, and A. Apsel, “Fabrication of SOI-based nano-gratings for Moiré measurement using focused ion beam,” Sens. Actuators A Phys.115(1), 60–66 (2004). [CrossRef]
  10. J. McKelvie, D. Pritty, and C. A. Walker, “An automatic fringe analysis interferometer for rapid Moiré stress analysis,” in 4th European Electro-Optics Conference (SPIE, Bellingham, 1979), pp. 175–188.
  11. S. Y. Chou, P. R. Krauss, and P. J. Renstrom, “Imprint of sub-25nm vias and trenches in polymers,” Appl. Phys. Lett.67(21), 3114–3116 (1995). [CrossRef]
  12. I. Amidror, The Theory of the Moiré Phenomenon (Springer-Verlag, London, 2009), Chap.2.
  13. L. S. Kong, S. Cai, Z. X. Li, G. Jin, S. Huang, K. Xu, and T. Wang, “Interpretation of moiré phenomenon in the image domain,” Opt. Express19(19), 18399–18409 (2011). [CrossRef] [PubMed]
  14. Z. G. Xu, H. K. Taylor, D. S. Boning, S. F. Yoon, and K. Youcef-Toumi, “Large-area and high-resolution distortion measurement based on moiré fringe method for hot embossing process,” Opt. Express17(21), 18394–18407 (2009). [CrossRef] [PubMed]
  15. H. M. Xie, Q. H. Wang, S. Kishimoto, and F. Dai, “Characterization of planar periodic structure using inverse laser scanning confocal microscopy moiré method and its application in the structure of butterfly wing,” J. Appl. Phys.101(10), 103511 (2007). [CrossRef]

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