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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 20, Iss. 4 — Feb. 13, 2012
  • pp: 3883–3889

Advanced broadband monitoring for thin film deposition through equivalent optical admittance loci observation

Kai Wu, Cheng-Chung Lee, and Tzu-Ling Ni  »View Author Affiliations


Optics Express, Vol. 20, Issue 4, pp. 3883-3889 (2012)
http://dx.doi.org/10.1364/OE.20.003883


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Abstract

A monitoring technique using the equivalent optical admittance loci of thin films to control the deposition is presented. Real-time broadband spectrum measurements are employed to extract the real-time thin film refraction index and thickness, and the corresponding equivalent optical admittance is thereby obtained. This monitoring method can predict the termination point of the deposition process and avoid the termination ambiguities, which generally appear with other broadband monitors. Compared to other monitoring methods, the experimental results of the proposed monitoring technique show better error compensation ability.

© 2012 OSA

OCIS Codes
(310.1620) Thin films : Interference coatings
(310.1860) Thin films : Deposition and fabrication

ToC Category:
Thin Films

History
Original Manuscript: November 23, 2011
Revised Manuscript: January 29, 2012
Manuscript Accepted: January 30, 2012
Published: February 1, 2012

Citation
Kai Wu, Cheng-Chung Lee, and Tzu-Ling Ni, "Advanced broadband monitoring for thin film deposition through equivalent optical admittance loci observation," Opt. Express 20, 3883-3889 (2012)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-20-4-3883


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References

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