Fast fabrication of nano-structured anti-reflection layers for enhancement of solar cells performance using plasma sputtering and infrared assisted roller embossing techniques

doi:10.1364/OE.20.005143

Fast fabrication of nano-structured anti-reflection layers for enhancement of solar cells performance using plasma sputtering and infrared assisted roller embossing techniques

Shih-Jung Liu and Che-Ting Liao »View Author Affiliations

Optics Express, Vol. 20, Issue 5, pp. 5143-5150 (2012)
http://dx.doi.org/10.1364/OE.20.005143

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Abstract

This paper reports the continuous fabrication of dual-side nano-structured anti-reflection protective layer for performance enhancement of solar cells using plasma sputtering and infrared assisted roller embossing techniques. Nano-structures were first deposited onto the surface of glass substrates using the plasma sputtering technique. After electroforming, a nickel master mold containing nano-array of 30 nm was obtained. The mold was then attached to the surfaces of the two metallic rollers in an infrared assisted roll-to-roll embossing facility. The embossing facility was used to replicate the nano-structures onto 60 μm thick polyethylene terephthalate (PET) films in the experiments. The embossed films were characterized using UV–vis spectrophotometer, atomic force microscope (AFM), and scanning electron microscope (SEM); its total conversion efficiency for solar cells was also measured by a solar simulator. The experimental results showed that the fabricated films could effectively reduce the reflectance and increase the conversion efficiency of solar cells. The proposed method shows great potential for fast fabrication of the anti-reflection protective layer of solar cells due to its simplicity and versatility.

OCIS Codes
(220.0220) Optical design and fabrication : Optical design and fabrication
(220.4000) Optical design and fabrication : Microstructure fabrication
(230.0230) Optical devices : Optical devices

ToC Category:
Solar Energy

History
Original Manuscript: November 21, 2011
Revised Manuscript: February 5, 2012
Manuscript Accepted: February 14, 2012
Published: February 16, 2012

Citation
Shih-Jung Liu and Che-Ting Liao, "Fast fabrication of nano-structured anti-reflection layers for enhancement of solar cells performance using plasma sputtering and infrared assisted roller embossing techniques," Opt. Express 20, 5143-5150 (2012)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-20-5-5143

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References

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T. F. Yao, P. H. Wu, T. M. Wu, C. W. Cheng, and S. Y. Yang, “Fabrication of anti-reflective structures using hot embossing with a stainless steel template irradiated by femtosecond laser,” Microelectron. Eng.88(9), 2908–2912 (2011). [CrossRef]

Bae, B. J.
Chang, W. Y.
Chen, J. Y.
Cheng, C. W.
Choi, K. W.
Deng, W. C.
El Chaar, L.
El Zein, N.
Fukui, K.
Green, M. A.
Han, K. S.
Hong, E. J.
Hong, S. H.
Inomata, Y.
Jiang, B.
Jiang, P.
Kim, D.
Lamont, L. A.
Lee, H.
Shibata, N.
Shin, J. H.
Shirasawa, K.
Sun, C. H.
Sun, K. W.
Wu, J. T.
Wu, P. H.
Wu, T. M.
Yang, S. Y.
Yao, T. F.
Yoon, W. Y.
Zhao, J.

Appl. Phys. Lett.

C. H. Sun, P. Jiang, and B. Jiang, “Broadband moth-eye antireflection coatings on silicon,” Appl. Phys. Lett.92(6), 061112 (2008). [CrossRef]

Electron. Mater. Lett.

S. H. Hong, B. J. Bae, K. S. Han, E. J. Hong, H. Lee, and K. W. Choi, “Imprinted moth-eye antireflection patterns on glass substrate,” Electron. Mater. Lett.5(1), 39–42 (2009). [CrossRef]

IEEE Trans. Electron. Dev.

J. Zhao and M. A. Green, “Optimized antireflection coatings for high-efficiency silicon solar cells,” IEEE Trans. Electron. Dev.38(8), 1925–1934 (1991). [CrossRef]

Jpn. J. Appl. Phys.

N. Shibata, “Plasma-chemical vapor-deposited silicon oxide/silicon oxynitride double-layer antireflective coating for solar cells,” Jpn. J. Appl. Phys.30(Part 1, No. 5), 997–1001 (1991). [CrossRef]

Microelectron. Eng.

J. T. Wu, S. Y. Yang, W. C. Deng, and W. Y. Chang, “A novel fabrication of polymer film with tapered sub-wavelength structures for anti-reflection,” Microelectron. Eng.87(10), 1951–1954 (2010). [CrossRef]
T. F. Yao, P. H. Wu, T. M. Wu, C. W. Cheng, and S. Y. Yang, “Fabrication of anti-reflective structures using hot embossing with a stainless steel template irradiated by femtosecond laser,” Microelectron. Eng.88(9), 2908–2912 (2011). [CrossRef]

Renew. Sustain. Energy Rev.

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Sol. Energy Mater. Sol. Cells

Y. Inomata, K. Fukui, and K. Shirasawa, “Surface texturing of large area multicrystalline silicon solar cells using reactive ion etching method,” Sol. Energy Mater. Sol. Cells48(1-4), 237–242 (1997). [CrossRef]
J. Y. Chen and K. W. Sun, “Enhancement of the light conversion efficiency of silicon solar cells by using nanoimprint anti-reflection layer,” Sol. Energy Mater. Sol. Cells94(3), 629–633 (2010). [CrossRef]
K. S. Han, J. H. Shin, W. Y. Yoon, and H. Lee, “Enhanced performance of solar cells with anti-reflection layer fabricated by nano-imprint lighography,” Sol. Energy Mater. Sol. Cells95(1), 288–291 (2011). [CrossRef]
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1991, Zhao, IEEE Trans. Electron. Dev.
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