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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 20, Iss. 6 — Mar. 12, 2012
  • pp: 6185–6190

Optics InfoBase > Optics Express > Volume 20 > Issue 6 > Page 6185

Extreme ultraviolet light source based on intracavity high harmonic generation in a mode locked Ti:sapphire oscillator with 9.4 MHz repetition rate

Enikoe Seres, Jozsef Seres, and Christian Spielmann  »View Author Affiliations


Optics Express, Vol. 20, Issue 6, pp. 6185-6190 (2012)
http://dx.doi.org/10.1364/OE.20.006185


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Abstract

We report on the realization of an intracavity high harmonic source with a cutoff above 30 eV. The EUV source is based on a high power, hard-aperture, Kerr-lens mode-locked Ti:sapphire oscillator with a repetition rate of 9.4 MHz. The laser is operated in the net negative dispersion regime resulting in intracavity pulses as short as 17 fs with 1 µJ pulse energy. In a second intracavity focus, intensity more than 1014 W/cm2 has been achieved, which is sufficient for high harmonic generation in a Xenon gas jet.

© 2012 OSA

OCIS Codes
(140.3590) Lasers and laser optics : Lasers, titanium
(190.4160) Nonlinear optics : Multiharmonic generation
(190.7110) Nonlinear optics : Ultrafast nonlinear optics
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)

ToC Category:
Lasers and Laser Optics

History
Original Manuscript: February 3, 2012
Revised Manuscript: February 28, 2012
Manuscript Accepted: February 29, 2012
Published: March 1, 2012

Citation
Enikoe Seres, Jozsef Seres, and Christian Spielmann, "Extreme ultraviolet light source based on intracavity high harmonic generation in a mode locked Ti:sapphire oscillator with 9.4 MHz repetition rate," Opt. Express 20, 6185-6190 (2012)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-20-6-6185


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References

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