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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 20, Iss. 7 — Mar. 26, 2012
  • pp: 8006–8014

Extreme ultraviolet multilayer for the FERMI@Elettra free electron laser beam transport system

Alain Jody Corso, Paola Zuppella, David L. Windt, Marco Zangrando, and Maria Guglielmina Pelizzo  »View Author Affiliations

Optics Express, Vol. 20, Issue 7, pp. 8006-8014 (2012)

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In this work we present the design of a Pd/B4C multilayer structure optimized for high reflectance at 6.67 nm. The structure has been deposited and also characterized along one year in order to investigate its temporal stability. This coating has been developed for the beam transport system of FERMI@Elettra Free Electron Laser: the use of an additional aperiodic capping layer on top of the structure combines the high reflectance with filter properties useful in rejecting the fundamental harmonic when the goal is to select the third FEL harmonic.

© 2012 OSA

OCIS Codes
(140.2600) Lasers and laser optics : Free-electron lasers (FELs)
(230.4170) Optical devices : Multilayers
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)
(310.4165) Thin films : Multilayer design

ToC Category:
Lasers and Laser Optics

Original Manuscript: December 13, 2011
Revised Manuscript: January 30, 2012
Manuscript Accepted: March 7, 2012
Published: March 22, 2012

Alain Jody Corso, Paola Zuppella, David L. Windt, Marco Zangrando, and Maria Guglielmina Pelizzo, "Extreme ultraviolet multilayer for the FERMI@Elettra free electron laser beam transport system," Opt. Express 20, 8006-8014 (2012)

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